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      KCI등재 SCIE SCOPUS

      Electrical properties of the multilayered PZT/BaTiO₃/PZT thick films

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      https://www.riss.kr/link?id=A104498221

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      다국어 초록 (Multilingual Abstract)

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃
      by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating method with PZT
      thick films and once more thick films of the PZT by a screen printing method on the BaTiO₃layer. We investigated the effect
      of phase, composition, and interfacial state of the BaTiO₃ thin film layers at the interface between the PZT thick films. The
      structural and the dielectric properties were investigated for the effect of various stacking sequences of sol-gel-prepared
      BaTiO₃ layers at the interface of the PZT thick films. The insertion of the BaTiO₃ interlayer yielded PZT thick films with
      homogeneous and dense grain structures regardless of the number of the BaTiO₃ layers. These results suggested that there is
      coexistence of the PZT phase and the BaTiO₃ phase or the presence of a modified BaTiO₃ at the interfaces between the PZT
      thick films. The leakage current density of a multilayered PZT-7 film is less that 1.5×10−9 A/cm2 at 5 V.
      번역하기

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃ by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating method...

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃
      by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating method with PZT
      thick films and once more thick films of the PZT by a screen printing method on the BaTiO₃layer. We investigated the effect
      of phase, composition, and interfacial state of the BaTiO₃ thin film layers at the interface between the PZT thick films. The
      structural and the dielectric properties were investigated for the effect of various stacking sequences of sol-gel-prepared
      BaTiO₃ layers at the interface of the PZT thick films. The insertion of the BaTiO₃ interlayer yielded PZT thick films with
      homogeneous and dense grain structures regardless of the number of the BaTiO₃ layers. These results suggested that there is
      coexistence of the PZT phase and the BaTiO₃ phase or the presence of a modified BaTiO₃ at the interfaces between the PZT
      thick films. The leakage current density of a multilayered PZT-7 film is less that 1.5×10−9 A/cm2 at 5 V.

      더보기

      다국어 초록 (Multilingual Abstract)

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃
      by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating method with PZT
      thick films and once more thick films of the PZT by a screen printing method on the BaTiO₃layer. We investigated the effect
      of phase, composition, and interfacial state of the BaTiO₃ thin film layers at the interface between the PZT thick films. The
      structural and the dielectric properties were investigated for the effect of various stacking sequences of sol-gel-prepared
      BaTiO₃ layers at the interface of the PZT thick films. The insertion of the BaTiO₃ interlayer yielded PZT thick films with
      homogeneous and dense grain structures regardless of the number of the BaTiO₃ layers. These results suggested that there is
      coexistence of the PZT phase and the BaTiO₃ phase or the presence of a modified BaTiO₃ at the interfaces between the PZT
      thick films. The leakage current density of a multilayered PZT-7 film is less that 1.5×10−9 A/cm2 at 5 V.
      번역하기

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃ by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating metho...

      Multilayered PZT/BaTiO₃/PZT thick/thin/thick films were fabricated by two different methods-thick films of Pb₁.₁(Zr0.52Ti0.48)O₃
      by a screen printing method on alumina substrate electrode with Pt, thin films of BaTiO₃by a spin-coating method with PZT
      thick films and once more thick films of the PZT by a screen printing method on the BaTiO₃layer. We investigated the effect
      of phase, composition, and interfacial state of the BaTiO₃ thin film layers at the interface between the PZT thick films. The
      structural and the dielectric properties were investigated for the effect of various stacking sequences of sol-gel-prepared
      BaTiO₃ layers at the interface of the PZT thick films. The insertion of the BaTiO₃ interlayer yielded PZT thick films with
      homogeneous and dense grain structures regardless of the number of the BaTiO₃ layers. These results suggested that there is
      coexistence of the PZT phase and the BaTiO₃ phase or the presence of a modified BaTiO₃ at the interfaces between the PZT
      thick films. The leakage current density of a multilayered PZT-7 film is less that 1.5×10−9 A/cm2 at 5 V.

      더보기

      참고문헌 (Reference)

      1 J. Carrano, 38 (38): 255-258, 1991

      2 Insung Kim, "Tunable Properties of Ferroelectric Thick films with MgO added on (BaSr)TiO₃" 대한전기학회 2 (2): 391-395, 2007

      3 Abicht, H., "The influence of the milling liquid on the properties of barium titanate powders and ceramics" 51 (51): 478-492, 1997

      4 G. S. Wang, "Properties of highly (100) oriented Ba0.9Sr0.1TiO3/LaNiO3 heterostructures prepared by chemical solution routes" 78 (78): 4172-4174, 2001

      5 A. F. Tasch Jr., "Memory Cell, and Technology Issues for 64-and 256-Mbit One-Transistor Cell MOS DRAMs" 77 (77): 17-26, 1990

      6 L. Baginsky, "Information Writing Mechanism in Thin Film MFIS-Structures, Ferroelectrics" 259-268, 1992

      7 W. P. Noble, "Fundamental Limitations on DRAM Storage Capacitors" 45 : 156-161, 1984

      8 Raza Moazzami, "Electrical characteristics of ferroelectric PZT thin films for DRAM applications" 39 : 2044-2049, 1992

      9 M. Azuma, "Electrical characteristics of High Dielectric Constant Materials for Integrated Ferroelectrics" 109-102, 1992

      10 S. G. Lee, "Dielectric properties of sol-gel derived PZT(40/60)/(60/40) heterolayered thin films" 353 : 244-247, 1999

      1 J. Carrano, 38 (38): 255-258, 1991

      2 Insung Kim, "Tunable Properties of Ferroelectric Thick films with MgO added on (BaSr)TiO₃" 대한전기학회 2 (2): 391-395, 2007

      3 Abicht, H., "The influence of the milling liquid on the properties of barium titanate powders and ceramics" 51 (51): 478-492, 1997

      4 G. S. Wang, "Properties of highly (100) oriented Ba0.9Sr0.1TiO3/LaNiO3 heterostructures prepared by chemical solution routes" 78 (78): 4172-4174, 2001

      5 A. F. Tasch Jr., "Memory Cell, and Technology Issues for 64-and 256-Mbit One-Transistor Cell MOS DRAMs" 77 (77): 17-26, 1990

      6 L. Baginsky, "Information Writing Mechanism in Thin Film MFIS-Structures, Ferroelectrics" 259-268, 1992

      7 W. P. Noble, "Fundamental Limitations on DRAM Storage Capacitors" 45 : 156-161, 1984

      8 Raza Moazzami, "Electrical characteristics of ferroelectric PZT thin films for DRAM applications" 39 : 2044-2049, 1992

      9 M. Azuma, "Electrical characteristics of High Dielectric Constant Materials for Integrated Ferroelectrics" 109-102, 1992

      10 S. G. Lee, "Dielectric properties of sol-gel derived PZT(40/60)/(60/40) heterolayered thin films" 353 : 244-247, 1999

      11 Lefort-Courtois, V., "Control of the Composition of (Pb,Ti)O3 and Pb(Zr,Ti)O3 Thin films Obtained by RF Magnetron Sputtering Using a New Design of Target" 19 : 1373-1377, 1999

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