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    RISS 인기검색어

      Photoresist Exposure Parameter Extraction from Refrctive Index Change during Exposure

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      https://www.riss.kr/link?id=E688661

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      다국어 초록 (Multilingual Abstract)

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      The refractive indices of photoresist are usually measured by an ellipsometer or spectrophotometer, but the values are limited to pre-exposure. It is known that the real and imaginary indices are changed during the exposure. But there is little report on these variations since it is difficult to measure this refractive index change at deep ultraviolet. The Dill ABC parameters show a significant variation with the resist and substrate thickness as well as the experimental conditions. A method is suggested to extract the parameters from the refractive index changes. We can get the refractive index change and extract the Dill ABC exposure parameters from that. The multiple thin film interference calculation is used to fit the measured transmittance data with other methods. The results are agreed well with the full multilayer thin film simulation.
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      The refractive indices of photoresist are usually measured by an ellipsometer or spectrophotometer, but the values are limited to pre-exposure. It is known that the real and imaginary indices are changed during the exposure. But there is little report...

      The refractive indices of photoresist are usually measured by an ellipsometer or spectrophotometer, but the values are limited to pre-exposure. It is known that the real and imaginary indices are changed during the exposure. But there is little report on these variations since it is difficult to measure this refractive index change at deep ultraviolet. The Dill ABC parameters show a significant variation with the resist and substrate thickness as well as the experimental conditions. A method is suggested to extract the parameters from the refractive index changes. We can get the refractive index change and extract the Dill ABC exposure parameters from that. The multiple thin film interference calculation is used to fit the measured transmittance data with other methods. The results are agreed well with the full multilayer thin film simulation.

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      목차 (Table of Contents)

      • ABSTRACT
      • 1.INTRODUCTION
      • 2.MULTIPLE THIN FILM INTERFERENCE
      • 3.EXPERIMENT
      • 4.REFRACTIVE INDEX CHANGE
      • ABSTRACT
      • 1.INTRODUCTION
      • 2.MULTIPLE THIN FILM INTERFERENCE
      • 3.EXPERIMENT
      • 4.REFRACTIVE INDEX CHANGE
      • 5.DILL EXPOSURE PARAMETER
      • 6.DISCUSSION
      • 7.참고문헌
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