갈륨합금과 아말감의 전기화학적 부식거동 비교 = Comparison of Electrochemical Corrosion Behavior Between Gallium Based-Alloy and Dental Amalgams

다국어 초록 (Multilingual Abstract)

A gallium based alloy(GA) that was developed as a substitute for dental amalgam was investigated for electrochemical corrosion behavior in 4 kinds of electrolytes(1% lactic acid, 0.05% HCI, Modified Fusayama's artificial saliva, and 0.9% NaCl). The related corroded microstructure were examined and microanalyses were conducted using ICPES. Polarization tests were conducted by scanning from -1,500㎷ to 1,000㎷(vs.SCE) at 75㎷/min.
The obtained results were as follows:
1. GA showed wide passivation area next to SYB in artificial saliva, suggesting good stability.
2. The amounts of Sn, Cu released from GA were similiar to those of CAV, and
decreased in the order of KAT, SYB.
3. All of specimens were observed pits at the area of pores in electrolytes containing chloride ions, and forming much corrosion products in 1% lactic acid and artificial saliva after corrosion test.
4. From the surface analyses of XRD, GA showed much corosion products containing
gallium at the surface after corrosion test.
In conclusion, the corrosion resistance of GA was lower than that of SYB and similiar to that of CAV and KAT.