Ferroelectric LiNbO_3 thin films are prepared by sol-gel method on p-Si (100), (111), and R-cut sapphire substrates. The film on Si substrates are polycrystalline whereas that on sapphire one is nearly epitaxial. Band gap energy of the film is found t...
Ferroelectric LiNbO_3 thin films are prepared by sol-gel method on p-Si (100), (111), and R-cut sapphire substrates. The film on Si substrates are polycrystalline whereas that on sapphire one is nearly epitaxial. Band gap energy of the film is found to be about 4.2 eV, which was roughly estimated from absorption edge. Polycrystalline film growth on Si substrates is investigated by spectroscopic ellipsometry. Density of the film increases as the thickness of the film increases. Most of the porosities of the film are formed at the interface between the film and substrate. The electrical property of the film is also reported.