Formation process of graphite film on Ni substrate with improved thickness uniformity through precipitation control

다국어 초록 (Multilingual Abstract)

<P><B>Abstract</B></P> <P>Large-scale graphitic thin film with high thickness uniformity needs to be developed for industrial applications. Graphitic films with thicknesses ranging from 3 to 20 nm have rarely been reported, and achieving the thickness uniformity in that range is a challenging task. In this study, a process for growing 20 nm-thick graphite films on Ni with improved thickness uniformity is demonstrated and compared with the conventional growth process. In the film grown by the process, the surface roughness and coverage were improved and no wrinkles were observed. Observations of the film structure reveal the reasons for the improvements and growth mechanisms.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Suggest a graphite film growth (precipitation) process which can improve the film thickness uniformity. </LI> <LI> Demonstrate the improved thickness uniformity by optical microscopy and atomic force microscopy. </LI> <LI> Suggest the film growth mechanism from the result of atomic force microscopy and transmission electron microscopy. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>