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      KCI등재 SCIE SCOPUS

      Synthesis and Characterization of a Novel Laser Ablation Sensitive Triazene Incorporated Epoxy Resin

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      https://www.riss.kr/link?id=A105873709

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      다국어 초록 (Multilingual Abstract)

      New triazene monomer was synthesized and further employed as a crosslinking agent partner with epoxy matrix using ethyl methyl imidazole as a curing agent in order to investigate the effect of triazene moieties on polymeric properties for laser ablation application. The synthesized triazene monomer was characterized by analytical and spectroscopic methods, while the surface morphology of resist after laser ablation was visualized by optical laser scanning images and scanning electron microscopy. Thermogravimetrical investigations indicate the loss of nitrogen being the initial thermal decomposition step and exhibit sufficient stabilities for the requirements for laser ablation application. Fourier transform infra-red, nuclear magnetic resonance, and gas chromatography analyses showed the successful synthesis of triazene. The ablation results from the optical laser scanning images revealed that the etching depth could be controlled by varying the concentration of triazene monomer in the formulation of epoxy. The shear strength analysis revealed that that the shear strength increased with increasing the amount of triazene in the formulation of direct ablation sensitive resist.
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      New triazene monomer was synthesized and further employed as a crosslinking agent partner with epoxy matrix using ethyl methyl imidazole as a curing agent in order to investigate the effect of triazene moieties on polymeric properties for laser ablati...

      New triazene monomer was synthesized and further employed as a crosslinking agent partner with epoxy matrix using ethyl methyl imidazole as a curing agent in order to investigate the effect of triazene moieties on polymeric properties for laser ablation application. The synthesized triazene monomer was characterized by analytical and spectroscopic methods, while the surface morphology of resist after laser ablation was visualized by optical laser scanning images and scanning electron microscopy. Thermogravimetrical investigations indicate the loss of nitrogen being the initial thermal decomposition step and exhibit sufficient stabilities for the requirements for laser ablation application. Fourier transform infra-red, nuclear magnetic resonance, and gas chromatography analyses showed the successful synthesis of triazene. The ablation results from the optical laser scanning images revealed that the etching depth could be controlled by varying the concentration of triazene monomer in the formulation of epoxy. The shear strength analysis revealed that that the shear strength increased with increasing the amount of triazene in the formulation of direct ablation sensitive resist.

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      참고문헌 (Reference)

      1 N. Sathiakumar, 41 : 1-, 2011

      2 T. M. Klapötke, 28 : 13-, 2009

      3 D. M. Khramov, 39 : 4958-, 2005

      4 R. Lazny, 60 : 121-, 2004

      5 E. C. Buruiana, 186 : 270-, 2007

      6 J. Lim, 9 : 404-, 2012

      7 L. Rappa, 520 : 3043-, 2012

      8 K. S. Kaur, 105 : 113119-, 2009

      9 S. L. Matheson, 51 : 11-, 2003

      10 F. Marchesi, 56 : 275-, 2007

      1 N. Sathiakumar, 41 : 1-, 2011

      2 T. M. Klapötke, 28 : 13-, 2009

      3 D. M. Khramov, 39 : 4958-, 2005

      4 R. Lazny, 60 : 121-, 2004

      5 E. C. Buruiana, 186 : 270-, 2007

      6 J. Lim, 9 : 404-, 2012

      7 L. Rappa, 520 : 3043-, 2012

      8 K. S. Kaur, 105 : 113119-, 2009

      9 S. L. Matheson, 51 : 11-, 2003

      10 F. Marchesi, 56 : 275-, 2007

      11 L. Stroea, 54 : 389-, 2009

      12 R. Srinivasan, 89 : 1303-, 1989

      13 R. Fardel, 254 : 1332-, 2007

      14 T. Lippert, 186 : 14-, 2002

      15 P. S. Tsai, 39 : 27-, 2003

      16 A. M. Brito-Silva, 2010 : 7-, 2010

      17 J. Wang, 154 : 571-, 2000

      18 E. Sternberg, 26 : 3861-, 2005

      19 J. Ihlemann, 1361 : 1011-, 1990

      20 이봉구, "Micro-Droplet Deposition by UV-Pulsed Laser Induced Forward Transfer Direct Writing Technology" 대한금속·재료학회 8 (8): 631-637, 2012

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      학술지등록 한글명 : Electronic Materials Letters
      외국어명 : Electronic Materials Letters
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2013-10-01 평가 등재학술지 선정 (기타) KCI등재
      2011-01-01 평가 등재후보학술지 유지 (기타) KCI등재후보
      2009-12-29 학회명변경 한글명 : 대한금속ㆍ재료학회 -> 대한금속·재료학회 KCI등재후보
      2008-01-01 평가 SCIE 등재 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 1.68 0.41 1.08
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.89 0.83 0.333 0.06
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