Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing

다국어 초록 (Multilingual Abstract)

1. Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing.
We demonstrate a selective atomic layer deposition of TiO_(2) thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrate. The patterned monolayers define and direct the selective deposition of the TiO_(2) thin film using atomic layer deposition. The selective atomic layer deposition is based on the fact that the TiO_(2) thin film is selectively deposited only on the regions exposing the silanol groups of the Si substrates because the regions covered with the alkylsiloxane monolayers do not have any functional group to react with precursors.
2. Atomic layer deposition of Titanium oxide on self-assembled monolayer-coated gold.
We demonstrate an atomic layer deposition of TiO_(2) thin films on self-assembled monolayers of ω-functionalized alkanethiolates. The TiO_(2) thin films were grown on OH-terminated alkanethiolate monolayer-coated gold by atomic layer deposition at 100℃. The atomic layer deposition of the TiO_(2) thin films is self-controlled and extremely linear relative to the number of cycles. Selective deposition of the TiO_(2) thin film using atomic layer deposition was accomplished with patterned self-assembled monolayers as templates. Microcontact printing was one to prepare the patterned monolayers of the alkanethiolates on gold substrates. The selective atomic layer deposition is based on the fact that the TiO_(2) thin film is selectively deposited only on the regions exposing OH-terminated alkanethiolate monolayers of the gold substrates, because the regions covered with CH_(3)-terminated monolayers do not have any functional group to react with precursors.

목차 (Table of Contents)

• Abstract = ⅰ
• List = ⅲ
• List of Figure = ⅵ
• Table = xii
• Ⅰ. Introduction = 1
• Ⅱ. Theory = 3
• 1. Lithography = 3
• 1-1. 서론 = 3
• 1-2. Lithography의 분류 = 5
• 2. Soft-lithogrphy = 8
• 2-1. 서론 = 8
• 2-2. Soft-lithography의 분류 = 9
• 2-3. Soft-lithography의 종류 및 방법 = 10
• 2-3-1. Microcontact Printing (미세접촉인쇄) = 10
• 2-3-2. Microtransfer Molding(미소전이 주조) = 12
• 2-3-3. Micromolding in Capillaries (모세관내 미소몰딩) = 13
• 2-3-4. Capillary Force Lithography = 15
• 2-3-5. Solvent-Assisted Micromolding(SAMIM) = 16
• 2-3-6. Replica Molding(복제 주조) = 18
• 2-3-7. Imprinting = 19
• 2-3-8. Decal Transfer Microlithography = 20
• 3. Microcontact Printing(미세접촉 인쇄) = 21
• 3-1. PDMS(polydimethylsiloxane)도장 제작 = 21
• 3-2. Microcontact Printing 의 응용 = 23
• 4. Self-Assembled Monolayers(SAMs)의 원리 = 25
• 4-1. 서론 = 25
• 5. Atomic Layer Deposition (ALD) = 28
• 5-1. 서론 = 28
• 5-2. 원자층 증착의 개념 = 29
• 5-2-1. 원자층 증착의 메커니즘 = 30
• 5-3. ALD의 장점 = 31
• 6. 주사 탐침 현미경 (Scanning Probe Microscope) = 33
• 6-1. 서론 = 33
• 6-2. STM (Scanning Tuneling Microscope)의 원리 = 35
• 6-3. AFM(Atomic Force Microscope)의 원리 = 37
• 6-3-1. AFM의 구조 = 37
• 6-3-2. Contact mode 원리 = 39
• 6-3-3. Tapping mode 원리 = 41
• 7. X -ray Photoelectron spectroscopy (XPS) = 44
• 7-1. 서론 = 44
• 7-2. XPS의구조 = 45
• 7-3. XPS의 기본 원리 = 47
• 8. 접촉각 (Contact Angle Analysis) = 49
• 8-1. 원리 = 49
• Ⅲ. Experiment = 51
• 1. Formation of patterned SAMs using microcontact printing on silicon = 51
• 1-1. Introduction = 51
• 1-2. Experiment = 52
• 1-3. Result = 59
• 1-3-1. AFM image = 59
• 1-4. Discussion = 62
• 2. Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing. = 64
• 2-1. Introduction = 64
• 2-2. Experiment = 68
• 2-2-1. ALD 법을 이용한 TiO_(2) thin films 증착 = 68
• 2-2-2. 패턴된 SAMs 기질 위에 선택적으로 증착된 TiO_(2) thin films의 positive pattern. = 71
• 2-3. Result = 74
• 2-3-1. ALD를 통하여 형성된 TiO_(2) thin films의 특성 분석 = 74
• 2-3-2. AFM image = 77
• 2-4. Discussion = 79
• 3. Formation of patterned SAMs using microcontact printing-coated gold = 80
• 3-1. Introduction = 80
• 3-2. Experiment = 81
• 3-2-1. Gold 기질 위에 hexadecanethiol 을 이용한 micrometer size의 패턴닝 = 85
• 3-2-2. Gold 기질 위에 octadecanethiol을 이용한 submicrometer size의 패턴닝 = 86
• 3-3. Result = 91
• 3-3-1. AFM image = 91
• 3-4. Discussion = 95
• 4. Atomic layer deposition of Titanium oxide on self-assembled monolayer-coated gold = 96
• 4-1. Introduction = 96
• 4-2. Experiment = 97
• 4-2-1. Gold에 다양한 SAMs 를 하여 표면 특성 부여 = 97
• 4-2-2. 기질에 따른 TiO_(2) thin film의 증착 여부 = 98
• 4-2-3. MUO SAMs위에 ALD법을 이용한 TiO_(2) thin films 증착 = 103
• 4-2-4. 패턴된 thiol-SAMs위에 선택적으로 증착된 TiO_(2) thin film의 positive pattern = 105
• 4-3. Result = 107
• 4-3-1. AFM image = 107
• 4-4. Discussion = 110
• Ⅳ. References = 111