반응성 이온 증착법에 의한 타이타늄 질화물 피막의 구조 및 성질에 미치는 기판온도와 질소압력의 영향 = Effects of Substrate Temperature and N2 Pressure on the Properties and Structure of titanium Nitride Deposits by Reactive Ion Plating

다국어 초록 (Multilingual Abstract)

Titanium nitride films were deposited onto the high speed steel substrates by reactive ion plating method The substrate temperature and ;partial pressure of the N₂gas were controlled as process variables. The nitride phases in the films were identified by X-Ray diffraction technique and were observed in a scanning electron microscope. The hardnesses of deposited films were also measured. The phases presented in the coatings could be predicted from nitrogen gas pressure. And the structure modification by ion bombardment during deposition was also observed. The maximum hardness values of 2800-3300 KHN were obtained at the nitrogen pressure of 0.8×10_(-3) torr.

목차 (Table of Contents)

• 1. 서론
• 2. 실험장치 및 실험방법
• 2.1 실험장치
• 2.2 실험방법
• 3. 결과 및 고찰
• 3.1 스퍼터 클리닝
• 3.2 증착막의 상
• 5. 결론