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DBpiaIn this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized pol...
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RISS 인기검색어
https://www.riss.kr/link?id=A82287919
- 저자
- 발행기관
- 학술지명
- 권호사항
-
발행연도
2006
-
작성언어
Korean
-
KDC
560
-
자료형태
학술저널
-
수록면
1408-1409(2쪽)
- 제공처
-
0
상세조회 -
0
다운로드
부가정보
다국어 초록 (Multilingual Abstract)
In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (IT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance anaiyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU : Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.
In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (IT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance anaiyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU : Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.
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