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      VO2 hole injection layer : energy level alignment at the interface of N,N'-di(1-naphthyl)-N,N'-diphenyl-(1,1'-biphenyl)-4,4'-diamine (NPB)/VO2/ fluorine-tin-oxide (FTO)

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      https://www.riss.kr/link?id=T13597219

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      Energy level alignments at the interface of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) / VO2 / fluorine-doped tin oxide (FTO) were investigated by photoemission spectroscopy. The hole injection barrier between FTO and NPB was reduced from 1.38 eV to 0.59 eV with the insertion of VO2 hole injection layer (HIL). This is due to the direct hole injection from FTO to NPB through shallow valence band maximum (VBM) of VO2.
      Interestingly, VO2 can also act as a charge generation layer (CGL) at the same time due to its small band gap of 0.7 eV. Its conduction band minimum(CBM) is relatively close to the Fermi level, thus electrons from the highest occupied molecular orbital (HOMO) of NPB can be easily extracted when a bias is applied under device operation.
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      Energy level alignments at the interface of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) / VO2 / fluorine-doped tin oxide (FTO) were investigated by photoemission spectroscopy. The hole injection barrier between FTO and...

      Energy level alignments at the interface of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) / VO2 / fluorine-doped tin oxide (FTO) were investigated by photoemission spectroscopy. The hole injection barrier between FTO and NPB was reduced from 1.38 eV to 0.59 eV with the insertion of VO2 hole injection layer (HIL). This is due to the direct hole injection from FTO to NPB through shallow valence band maximum (VBM) of VO2.
      Interestingly, VO2 can also act as a charge generation layer (CGL) at the same time due to its small band gap of 0.7 eV. Its conduction band minimum(CBM) is relatively close to the Fermi level, thus electrons from the highest occupied molecular orbital (HOMO) of NPB can be easily extracted when a bias is applied under device operation.

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