총설 : 새로운 비전통적 나노리소그라피 공정 = Review : New Unconventional Nanolithographic Methods

다국어 초록 (Multilingual Abstract)

This review is on unconventional nanolithographies that can replace the conventional photolithography. All these technique untilize a pattern mold and the patterning is realized by physical contact of the mold with the underlying polymer layer. They are cost-effective, applicable to small feature sizes that cannot be defined by photolihography, and to an extent applicable to non-planar surfaces. Imprint and soft lithographies are reviewed first, which is then followed by new lithographies of room-temperature imprint lithography, capillary force lithography and soft molding. These new techniques are also efficient and cost-effective in fabricating complex or three-dimensional patterns and structurees.