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    KCI등재 SCI SCIE SCOPUS

    Experimental Study on the Density Peaking of an RF Plasma at a Low Magnetic Field

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    https://www.riss.kr/link?id=A104335079

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    Density peaking of a plasma at a low magnetic field is investigated. In this experiment, a helicon
    plasma source with a 15-cm plasma column diameter is used. An rf power of 200 800 W with a
    frequency of 6 14 MHz is fed to a half-turn helical antenna located outside a Pyrex tube plasma
    enclosure. Experimental results show a loading resistance and an ion density peaking at several
    tens of gauss, and the peaking magnetic fields of these two parameters are reasonably the same.
    In addition, the dependency of the peaking magnetic field on the ion density seems to be matched
    with the dependence of the mode coupling magnetic field on the ion density. Mode coupling of
    a short-wavelength electrostatic wave called the TG mode and the helicon mode is formed at the
    corresponding magnetic field when the effect of electron inertia is included in the rf plasma with an
    axial magnetic field. The experimental result supports that density peaking at a low magnetic field
    is possibly caused by eigenmode formation around a mode coupling magnetic field. The loading
    resistance is usually found to be high for the eigenmodes, and a higher loading resistance yields
    an efficient rf power coupling to the plasma, thus, a higher plasma density. A plasma with a low
    magnetic field may have advantages, such as a relatively uniform plasma profile and a simple system
    for magnets and the power supply. This kind of density enhancement at a low magnetic field is,
    therefore, useful for applications requiring an efficient, uniform plasma.
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    Density peaking of a plasma at a low magnetic field is investigated. In this experiment, a helicon plasma source with a 15-cm plasma column diameter is used. An rf power of 200 800 W with a frequency of 6 14 MHz is fed to a half-turn helical antenna...

    Density peaking of a plasma at a low magnetic field is investigated. In this experiment, a helicon
    plasma source with a 15-cm plasma column diameter is used. An rf power of 200 800 W with a
    frequency of 6 14 MHz is fed to a half-turn helical antenna located outside a Pyrex tube plasma
    enclosure. Experimental results show a loading resistance and an ion density peaking at several
    tens of gauss, and the peaking magnetic fields of these two parameters are reasonably the same.
    In addition, the dependency of the peaking magnetic field on the ion density seems to be matched
    with the dependence of the mode coupling magnetic field on the ion density. Mode coupling of
    a short-wavelength electrostatic wave called the TG mode and the helicon mode is formed at the
    corresponding magnetic field when the effect of electron inertia is included in the rf plasma with an
    axial magnetic field. The experimental result supports that density peaking at a low magnetic field
    is possibly caused by eigenmode formation around a mode coupling magnetic field. The loading
    resistance is usually found to be high for the eigenmodes, and a higher loading resistance yields
    an efficient rf power coupling to the plasma, thus, a higher plasma density. A plasma with a low
    magnetic field may have advantages, such as a relatively uniform plasma profile and a simple system
    for magnets and the power supply. This kind of density enhancement at a low magnetic field is,
    therefore, useful for applications requiring an efficient, uniform plasma.

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    유사연구자 (20) 활용도상위20명

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    학술지 이력

    학술지 이력
    연월일 이력구분 이력상세 등재구분
    2023 평가 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
    2020-01-01 등재 등재학술지 유지 (해외등재 학술지 평가) KCI등재
    2011-01-01 등재 등재학술지 유지 (등재유지) KCI등재
    2009-01-01 등재 등재학술지 유지 (등재유지) KCI등재
    2007-01-01 등재 SCI 등재 (등재유지) KCI등재
    2005-01-01 등재 등재학술지 유지 (등재유지) KCI등재
    2002-07-01 등재 등재학술지 선정 (등재후보2차) KCI등재
    2000-01-01 등재 등재후보학술지 선정 (신규평가) KCI등재후보
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    학술지 인용정보

    학술지 인용정보
    기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
    2016 0.47 0.15 0.31
    KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
    0.26 0.2 0.26 0.03
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