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      KCI등재 SCIE SCOPUS

      Multidisciplinary optimization of etch process chamber on the basis of MCDM

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      https://www.riss.kr/link?id=A103788779

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      다국어 초록 (Multilingual Abstract)

      A multidisciplinary optimization integrating flow and plasma performance was used to develop an etch process chamber with dualfrequencycapacitively coupled plasma. Pressure and ion density characteristics are significantly influenced by structures, such as electrodegap, number of confinement rings, electrode radius, and process conditions of flow rate. This study aims to minimize the objectivefunctions of pressure and ion density simultaneously. Based on flow and plasma simulation, an approximation model is created usingquartic response surface method (RSM). A genetic algorithm was utilized to explore Pareto front. The concept of entropy weight is combinedwith the weight defined in analytic hierarchy process to create a synthetic weight over the objectives. The non-dominated solutionsare ranked by the modified technique for order preference by similarity to ideal solution. The ranking list helps arrive at rational decisionsand provide a unique solution. The optimum structure of the chamber is obtained and the final solution is discussed. The proposed optimizationframework improves the distribution profile of pressure and ion density.
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      A multidisciplinary optimization integrating flow and plasma performance was used to develop an etch process chamber with dualfrequencycapacitively coupled plasma. Pressure and ion density characteristics are significantly influenced by structures, su...

      A multidisciplinary optimization integrating flow and plasma performance was used to develop an etch process chamber with dualfrequencycapacitively coupled plasma. Pressure and ion density characteristics are significantly influenced by structures, such as electrodegap, number of confinement rings, electrode radius, and process conditions of flow rate. This study aims to minimize the objectivefunctions of pressure and ion density simultaneously. Based on flow and plasma simulation, an approximation model is created usingquartic response surface method (RSM). A genetic algorithm was utilized to explore Pareto front. The concept of entropy weight is combinedwith the weight defined in analytic hierarchy process to create a synthetic weight over the objectives. The non-dominated solutionsare ranked by the modified technique for order preference by similarity to ideal solution. The ranking list helps arrive at rational decisionsand provide a unique solution. The optimum structure of the chamber is obtained and the final solution is discussed. The proposed optimizationframework improves the distribution profile of pressure and ion density.

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      참고문헌 (Reference)

      1 A. Beskok, "Report: a model for flows in channels, pipes, and ducts at micro and nano scales" 3 (3): 43-77, 1999

      2 R. Stewart, "Plasma uniformity in high-density inductively coupled plasma tools" 4 (4): 36-, 1995

      3 T. Ni, "Plasma confinement apparatus, and method for confining a plasma"

      4 P. O’Dette, "Optimization of dry etch process conditions for HgCdTe detector arrays" 28 (28): 821-825, 1999

      5 G. Tipton, "Optimization of an electron cyclotron resonance plasma etch process for n+ polysilicon: HBr process chemistry" 12 (12): 416-421, 1994

      6 J. Lee, "Optimiza-tion of gas flow and etch depth uniformity for plasma etching of large area GaAs wafers" 46 (46): 685-688, 2002

      7 R. Olson, "Optimiza-tion of a Low Damage, High Resolution Etch Process for SiN x in an ECR Reactor" 143 (143): 288-292, 1996

      8 L. Yang, "Multiple-attribute decision-making approach for an energy-efficient facility layout design" 66 (66): 795-807, 2013

      9 J. R. Martins, "Multidisciplinary design optimization: A survey of architectures" 51 (51): 2049-2075, 2013

      10 R. Thirumalai, "Multi-criteria decision making in the selection of machining parameters for Inconel 718" 대한기계학회 27 (27): 1109-1116, 2013

      1 A. Beskok, "Report: a model for flows in channels, pipes, and ducts at micro and nano scales" 3 (3): 43-77, 1999

      2 R. Stewart, "Plasma uniformity in high-density inductively coupled plasma tools" 4 (4): 36-, 1995

      3 T. Ni, "Plasma confinement apparatus, and method for confining a plasma"

      4 P. O’Dette, "Optimization of dry etch process conditions for HgCdTe detector arrays" 28 (28): 821-825, 1999

      5 G. Tipton, "Optimization of an electron cyclotron resonance plasma etch process for n+ polysilicon: HBr process chemistry" 12 (12): 416-421, 1994

      6 J. Lee, "Optimiza-tion of gas flow and etch depth uniformity for plasma etching of large area GaAs wafers" 46 (46): 685-688, 2002

      7 R. Olson, "Optimiza-tion of a Low Damage, High Resolution Etch Process for SiN x in an ECR Reactor" 143 (143): 288-292, 1996

      8 L. Yang, "Multiple-attribute decision-making approach for an energy-efficient facility layout design" 66 (66): 795-807, 2013

      9 J. R. Martins, "Multidisciplinary design optimization: A survey of architectures" 51 (51): 2049-2075, 2013

      10 R. Thirumalai, "Multi-criteria decision making in the selection of machining parameters for Inconel 718" 대한기계학회 27 (27): 1109-1116, 2013

      11 X. Xu, "Modeling and Optimization of Pro-cess Parameters of a DF-CCP Etcher Chamber" 572 : 213-216, 2014

      12 C. Jia, "Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design" 14 (14): 1059-, 2012

      13 D. P. Lymberopoulos, "Fluid simulations of glow discharges: Effect of metastable atoms in argon" 73 (73): 3668-3679, 1993

      14 E. Kawamura, "Fast 2D hybrid fluid-analytical simulation of inductive/capacitive discharges" 20 (20): 035009-, 2011

      15 P. Shufflebotham, "Experimental validation of a direct simulation by Monte Carlo molecular gas flow model" 13 (13): 1862-1866, 1995

      16 Hong-Zhong Huang, "Evaluation and decision of products conceptual design schemes based on customer requirements" 대한기계학회 25 (25): 2413-2425, 2011

      17 Z. H. Zou, "Entropy method for determination of weight of evaluating indicators in fuzzy synthetic evalua-tion for water quality assessment" 18 (18): 1020-1023, 2006

      18 M. H. Khater, "Effects of gas dis-tribution on polysilicon etch rate uniformity for a low pressure, high density plasma" 16 (16): 490-495, 1998

      19 D. A. Shumate, "Development of a TiW plasma etch process using a mixture experiment and response surface optimization" 9 (9): 335-343, 1996

      20 V. Singh, "Designing low pressure systems with continuum models" 14 (14): 1252-1257, 1996

      21 S. Chakraborty, "Design of a material handling equipment selection model using analytic hierarchy process" 28 (28): 1237-1245, 2006

      22 D. L. Olson, "Comparison of weights in TOPSIS models" 40 (40): 721-727, 2004

      23 C. Corr, "Comparison between fluid simulations and experi-ments in inductively coupled argon/chlorine plasmas" 41 (41): 185202-, 2008

      24 L. Ren, "Comparative Analysis of a Novel M-TOPSIS Method and TOPSIS" 2007 : 2007

      25 "CFD-ACE+ user’s manual"

      26 Z. H. Bi, "A brief review of dual-frequency capacitively coupled discharges" 11 (11): S2-S8, 2011

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2012-11-05 학술지명변경 한글명 : 대한기계학회 영문 논문집 -> Journal of Mechanical Science and Technology KCI등재
      2010-01-01 평가 등재학술지 유지 (등재유지) KCI등재
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      외국어명 : KSME International Journal -> Journal of Mechanical Science and Technology
      KCI등재
      2006-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2004-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2001-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
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      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 1.04 0.51 0.84
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.74 0.66 0.369 0.12
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