Polybenzoxazole was synthesized by polymerizing various poly hydroxyamide precursors and it was confirmed that Pattern performed well using SEM which was confirmed to be synthesized using FT-IR and FT-NMR. PHA was synthesized using 0.2 eq of phthalic,...
Polybenzoxazole was synthesized by polymerizing various poly hydroxyamide precursors and it was confirmed that Pattern performed well using SEM which was confirmed to be synthesized using FT-IR and FT-NMR. PHA was synthesized using 0.2 eq of phthalic, Succinic anhydride, and maleic anhydride was synthesized at 0.1, 0.2, 0, 3 eq. All PHA synthesized was well dissolved in a flying solvent such as NMP, DMAc, DMSO. All synthesized PHAs were well dissolved in solvents such as NMP, DMAc, DMSO and others. The silicon wafer was fabricated at 3 cm x 3 cm and spin coated at 1000 rpm for 50 sec. Prebake was at 130 ~ 150 ℃ for 5 minutes. Aligner uses MIDAS's MDA-400S and give energy of 450mJ using the 365 nm I-line wavelength. Develop was carried out using tetramethylammonium hydroxide aqueous solution 2.38%, and the development time was adjusted in order to form the best line.