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1 강만구, "플렉시블 염료감응 대양전지 기술" 19 (19): 39-, 2006
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4 T. C. Chang, "The novel improvement of low dielectric constant methylsilsesquioxane by N2O plasma treatment" 146 : 3802-, 1999
5 A. Grill, "Structure of low dielectric constant to extreme low dielectric constant SIOCH films: Fourier transform infrared spectroscopy characteri- zation" 94 : 6697-, 2003
6 G. Galli, "Structural and electronic properties of amorphous carbon" 62 (62): 555-, 1989
7 P. Masri, "Silicon carbide and silicon carbide- based structures: The physics of epitaxy" 48 : 1-, 2002
8 P. R. Emtage, "Schottky emission through thin inslulating films" 8 (8): 267-, 1962
9 J. G. Simmons, "Pools-frenkel effect and schottky in metal-insuloror-metal systems" 155 : 657-, 1967
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