DC 마그네트론 스퍼터링법으로 제조된 Tio₂ 박막의 산소분압비에 따른 광분해 특성에 관한 연구 = A Study on Photocatalytic Degradation Properties by Oxygen Partial Pressure for Tio₂Thin Films Fabricated by DC Magnetron Sputtering

다국어 초록 (Multilingual Abstract)

This paper describes the photocatalytic degradation properties by oxygen partial pressure for TiO$_2$ thin films fabricated by dc magnetron reactive sputtering. And the structural, chemical, optical and photocatalytic properties were investigated at various analysis system. When TiO$_2$ thin film was made at deposition time of 120 min and Ar:O$_2$ ratio of 60:40, the best properties were obtained. That results were as follows: thickness; 360∼370 nm, gram size; 40 nm, optical energy band gap; 3.4 eV and Benzene conversion in the photocatalytic degradation; 11 %.