A Roll-to-Roll Nano Imprint Lithography System for Flexible Electronics

다국어 초록 (Multilingual Abstract)

A roll-to-roll nano imprint lithography system has been developed for flexible color filter manufacturing. This system is equipped with a precision pattern roll mold and a high speed alignment unit for web control. The precision pattern roll mold was fabricated by successive nano imprint lithography and electroforming process. By wrapping the electroformed sheet mold on a base roll, the precision pattern roll mold was realized with little dimensional error. The system can produce 296×210 ㎟ patterns on a 300 ㎜ wide flexible poly-ethylene-naphthalate substrate continuously. And it has ability to align patterns over a reference pattern to achieve ±8 ㎛ overlay accuracy using the alignment unit.