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鄭敎龐,尹志秀 弘益大學校 科學技術硏究所 2001 科學技術硏究論文集 Vol.12 No.-
We design a 1-by-4 optical splitter made of photonic crystal waveguides and analyze the properties of the optical splitter using the finite-difference time-domain method with perfectly-matched-layer absorbing boundaries. The photonic crystal is constructed by cylindrical rods in air on a square lattice. Our simulation results show that there are different transmission properties for four bend geometries and different incident-wave frequencies, and the incident power splits in the four arms with almost the same ratio. Moreover, we perform numerical simulations of T-shaped waveguide branches to reduce the reflections at the T-branches in the splitter. The branching region is treated as a cavity that couples the input and output waveguides. The improvement of transmission is achieved by placing the defects of extra rods in the branching region.
定電壓下 黃酸一蓚酸 混酸浴 中에서의 交流에 依한 알루미늄板의 陽極酸化
金敎秀,張學良 嶺南大學校 工業技術硏究所 1974 연구보고 Vol.2 No.1
混酸治 中에서 交流에 依한 20V 定電壓 下에서 알루미늄板을 陽極酸化시켜 生成한 酸化皮膜의 性質, 溶出한 Al量 및 coating ratio等을 液溫과 液의 濃度 變化에 따라 各 單獨浴을 使用하였을 경우를 相互 比較 檢討하였던 바 混酸治의 경우 50℃의 高溫에서도 黃酸 單獨浴의 경우보다 A1의 溶出量은 적고, 生成 酸化皮膜의 두께, 耐磨耗性 및 耐蝕性等 그 特性値는 좋았으며, 또한 修酸 單獨浴보다 耐磨耗性은 越等하게 좋으며, 酸化皮膜은 더 두껍게 生成되었다. The properties of aluminum oxide film formed, the amount of dissolved Al, etc. in the process of anodic oxidation of aluminum plate in H₂SO₄-H₂C₂O₄(4:1) mixed acid bath with the use of A.C. at constant voltage of 20V were compared with those obtained in either H₂SO₄or H₂C₂O₄simple acid bath under otherwise identical conditions. As a result, it was revealed, in the mixed acid bath, that 1) the amount of dissolved Al was smaller than that in H₂SO₄simple acid bath at various concentrations and temperature of the baths. It is indicative of the inhibiting effect H₂C₂O₄on the dissolution of Al: 2) the thickness, and abrasion and corrosion resistances of the film formed were thicker than and superior to those of the film obtain either in H₂SO₄or particularly in H₂C₂O₄simple acid bath: and 3) the film having the satisfactory characteristic properties was obtained even at high bath temperature of 50℃, and the decrease in the characteristic values of the film formed was gradual over 50℃. Thus, bath temperature can be easily controlled.