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- 저자 : Luong Chi Hieu (검색결과 6 건)
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Luong Chi Hieu,심윤수,이예림,정종율,오영완,박병국 한국물리학회 2015 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.67 No.7
The magneto-optical polar Kerr spectra of CoFeB/MgO thin films on different kinds of underlayers (Hf, Pt) were investigated in order to understand the origin of the interfacial perpendicular magnetic anisotropy (PMA) in that structure. The Kerr spectra were measured by using real-time Kerr spectroscopy based on a fiber-coupled high-speed spectrometer in the photon energy range of 1.5 2.9 eV. The magneto-optical studies revealed that the magneto-optical proximity effect due to the Hf underlayer to CoFeB was weak, but the interfacial contribution of the Pt underlayer to the CoFeB was strong. The variation of the PMA as a function of the annealing conditions was also investigated, and a gradual enhancement of the PMA was observed with increasing annealing temperature for the Pt underlayer sample, but a gradual decay of the PMA was observed for the Hf underlayer sample. The magneto-optical studies showed that the formation of CoPt alloys at the Pt/CoFeB interface played an important role in the PMA of the Pt/CoFeB/MgO structure at higher annealing temperature.
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Quantitative Trait Loci Associated with Heat Tolerance in Rice (Oryza sativa L.)
( Bui Chi Buu ),( Pham Thi Thu Ha ),( Bui Phuoc Tam ),( Tran Thi Nhien ),( Nguyen Van Hieu ),( Nguyen Trong Phuoc ),( Luong The Minh ),( Ly Hau Giang ),( Nguyen Thi Lang ) 한국육종학회 2014 Plant Breeding and Biotechnology Vol.2 No.1
A total of 310 BC2F2 lines derived from the cross of OM5930/N22 were evaluated for heat stress at flowering. Genetic map was set up with 264 polymorphic SSRs to detect linkage to the target traits. The map covers 2,741.63 cM with an average interval of 10.55 cM between two marker loci. Markers associated with heat tolerance were located mostly on chromosomes 3, 4, 6, 8, 10 and 11. The proportion of phenotypic variation explained by each QTL ranged from 17.1% for RM160 to 36.2% for RM3586. Four QTLs were detected for filled grains per panicle on chromosome 4 at the interval of RM468 - RM7076 and RM241 - RM26212, explaining 13.1 and 31.0% of the total phenotypic variation, respectively. Two QTLs controling unfilled grain percentage was also detected at loci RM554 and RM3686 on chromosome 3 explaining 25.0 and 11.2% of the total phenotypic variance. One QTL was detected for 1,000-grain weight located at the locus RM103 on chromosome 6, explaining 30.6% of the total phenotypic variance. Also, a QTL at the locus RM5749 on chromosome 4 was identified which explained 10.8% of the total phenotypic variance of grain yield. A single QTL at the interval of RM3586- RM160 on chromosome 3 was detected in conformity with the QTL findings for heat tolerance in previous studies.
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Fill factor controlled nanoimprinted ZnO nanowires based on atomic layer deposition
Srivathsava Surabhi,Chi Hieu Luong,김민이,Phuoc Cao Van,Viet Dongquoc,Rambabu Kuchi,이재웅,장효식,정종율 한국물리학회 2018 Current Applied Physics Vol.18 No.6
Enhanced diffraction by sub-wavelength nanostructures to convert incident electromagnetic radiation into waveguide modes has applications in anti-reflective coatings for optoelectronic devices. We propose a metal oxide (ZnO) nanowire grid polarizer as such a nanostructure, fabricated by ultraviolet nanoimprint lithography and whose fill factor (FF) is controlled by atomic layer deposition. Using finite difference time domain simulations, we investigated the polarization-dependent optical transmittance of the structures and calculated the polarizing efficiency. Optical profiles such as electric and magnetic field intensity and current density distributions of specific FF nanopatterns were determined for the transverse magnetic and transverse electric modes. The effects of geometrical parameters including the wire-grid period, fill ratio, and spacing between the wire-grid layers on diffraction wavelength were characterized. Respective FF-controlled ZnO nanowire structures were fabricated and their experimental optical transmittances were measured for nanowire grid polarizer applications.
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Fill factor controlled nanoimprinted ZnO nanowires based on atomic layer deposition
Surabhi, Srivathsava,Luong, Chi Hieu,Kim, Min Yi,Van, Phuoc Cao,Quoc, Viet Dong,Kuchi, Rambabu,Lee, Jae-Woong,Chang, Hyo-Sik,Jeong, Jong-Ryul ELSEVIER 2018 Current Applied Physics Vol.18 No.6
<P><B>Abstract</B></P> <P>Enhanced diffraction by sub-wavelength nanostructures to convert incident electromagnetic radiation into waveguide modes has applications in anti-reflective coatings for optoelectronic devices. We propose a metal oxide (ZnO) nanowire grid polarizer as such a nanostructure, fabricated by ultraviolet nanoimprint lithography and whose fill factor (FF) is controlled by atomic layer deposition. Using finite difference time domain simulations, we investigated the polarization-dependent optical transmittance of the structures and calculated the polarizing efficiency. Optical profiles such as electric and magnetic field intensity and current density distributions of specific FF nanopatterns were determined for the transverse magnetic and transverse electric modes. The effects of geometrical parameters including the wire-grid period, fill ratio, and spacing between the wire-grid layers on diffraction wavelength were characterized. Respective FF-controlled ZnO nanowire structures were fabricated and their experimental optical transmittances were measured for nanowire grid polarizer applications.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Fill factor (FF) controlled ZnO nanowires (NW) through atomic layer deposition (ALD), combined with UV-NIL were prepared. </LI> <LI> Polarizing efficiency of NWs has increased with ALD thickness at which stronger diffraction wavelengths are observed. </LI> <LI> ALD enables us to control the fill factor precisely in nanowire grid polarizer. </LI> <LI> Simulation results supported by experiments confirm that the proposed FF controlled ZnO NWs can be efficient polarizers. </LI> </UL> </P>
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Thanh Son Vo,Srivathsava Surabhi,Chi Hieu Luong,윤순길,이경동,박병국,정종율 한국물리학회 2015 Current Applied Physics Vol.15 No.7
In this study, we have systematically investigated a magnetic resonance absorption and tunability of absorption wavelength in isolated metal-insulator-metal (MIM) nanodot arrays with transmission geometry. The elemental electromagnetic resonances and their hybridizations are studied using 3- dimensional finite-difference time-domain (FDTD) calculation and resonance properties including the resonance peak tunability, magnetic permeability and quality (Q) factor are characterized with respect to the coupling strength. We have found the existence of electric and magnetic resonance mode in the MIM (Au/MgF2/Au) structure and the magnetic resonance has larger wavelength tunability than the electric resonance. The absorption cross section calculation revealed that absorption is the dominant extinction process at the magnetic resonance only. Magnetic permeability (m) calculations for the various MIM parameters showed the maximum value of the imaginary part of μ is 16.1 with Q factor of 9.2 when the size of nanodot is 200 nm and the inter-dot distance is 300 nm. The presented calculations can be used to tune the response of the magnetic resonance absorption with a variable resonance wavelength and Q factor by using the simple MIM structures with transmission geometry.
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