현대무용의 Leap 동작에서 숙련자와 비숙련자간의 운동학적 변인 비교 연구

김복영,배성제,정철수,이정은,임규찬 師範大學 體育硏究所 1992 서울大學校 體育硏究所論集 Vol.13 No.1

The purpose of this study was to compare kinematics of the skilled group with the corresponding of the unskilled group during the leap of the mordern dance and to investigate the effective movement patterns of the leap. The kinematic and temporal variables examined using the DLT(Direct Linear Transformation) method of three-dimensional cinematography were leap time, leap distance, leap height and body segment angles at the instants of take off, peak height and touch down. Four skilled and four unskilled groups were selected as the subjects. Two 16mm high speed cameras were used to monitor the subjects’movement patterns. T-test was used to determine if there is any significant (p<0.05) differences on kinematic variables between the skilled and unskilled groups. The conclusions obtained from the analyzed data were as follows; (1) There were not any significant differences between two groups for the angles of body segment at the instant of take off and leap distance. (2) At the instant of peak height, the leap angle and the left ankle angle for the skilled groups were larger than for unskilled groups. (3) At the instant of touch down, the trunk angle in the sagittal plane for the skilled groups were larger than for unskilled groups. (4) The flight time and height for the skilled groups were longer and higher than for the unskilled groups.

地籍境界 不一致 地域의 境界決定

김희규,김소철,이형복,홍철순 慶南專門大學 1998 論文集 Vol.26 No.1

REVERSE MOAT 식각 공정 유·무에 따른 STI-CMP 공정의 평탄화 특성

김철복,박성우,정소영,서용진 대불대학교 2001 論文集 Vol.7 No.1

Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for deep sub-micron technology. The rise throughput and the stability in the device fabrication can be obtained by applying CMP process to shallow trench isolation (STI) structure in 0.18㎛ semiconductor device. The reverse moat process has been added to employ in STI-CMP. Thus the process became complex and the defects were seriously increased. Removal rates of each thin films in STI-CMP was not equal, hence the devices must to be effected, that is, the damage was occurred in the device area for the case of excessive CMP process and the nitride film was remained on the device area for the case of insufficient CMP process than these defects affect the device characteristics. In this work, the high selectivity slurry(HSS) was developed to perform the direct global planarization without reverse moat etch step, and the planarization characteristics of STI-CMP process with and without reverse moat etch step were studied.

멀리뛰기 발구름 동작시 아킬레스건각이 도약속도와 도약각도에 미치는 영향

김복영,배성제,신인식,정철수,임규찬 師範大學 體育硏究所 1992 서울大學校 體育硏究所論集 Vol.13 No.2

The purpose of this study was to investigate the effect of lower leg planting angle an on take-off motion of the long jump. The Achilles tendon angle defined as the angle between shank and calcaneus with projection to XY plane was introduced to interprete lower leg motion uring last foot touch for the flight phase of long jump. A typical high speed film analysis technique including DLT method was adapted to record and analyze total of nineteen long jumps performed by elite athletes at two different track and field events. The following were found that: 1. The relationship between touch-down velocity, take-off velocity, range of vertical velocity and flight length were significantly related each others as r=0.6383, 0.6395 respectively at t=0.01 level. 2. It was not possible to reveal the relationship between take-off angle and flight length. Due to highly consistent take-off angles shown between the long jumpers. 3. The angular displacement of the shank during the last foot contact just before flight phase was negatively related to the flight length(r= -0.6149). However, it was not possible to find the relationship between the aehilles tendon angle and flight length. 4. As the range of the body C.O.G lean angle increased the last step foot contact time significantly increased(r=0.8625). 5. The foot contact time of Korean elite long jumpers was somewhat longer than that shown by foreign Athletes. It is concluded that maintaining touch-down velocity during initial phase of foot touch and increasing take-off velocity would result optimal take-off angle and good record. Decrease in the angular displacement of the shank, foot contact duration, and the range of body C.O.G lean angle were found to be important to improve the flight length.

Al_2O_3를 첨가한 LaFeO_3 박막의 암모니아 가스감지 특성

이복상,조철형,최부천,박기철,마대영,김정규 경상대학교 생산기술연구소 2002 工學硏究院論文集 Vol.2 No.-

LaFeO_3 thin films with 2%, 5% and 10% A1_2O_3 additives were fabricated by r.f. magnetron sputtering method on Al_2O_3 substrates. Structural, electrical and ammonia gas sensing characteristics of the thin films with different heat treatments were examined. From the XRD results, the compound of LaFeO_3 and Al_2O_3 was not found. Thin film with 5% Al_2O_3 additives, heat-treated at 800℃, showed the sensitivities of about 85% for 100ppm ammonia gas at the working temperature of 300℃. The response time to the ammonia gas was several seconds and the thin film showed good selectivity to NH_3 gas.

바나듐 산화막을 활용한 습도센서의 제조에 관한 연구

이승철,최복길,김남철 公州大學校 工學硏究院 生産技術硏究所 2004 論文集 Vol.12 No.-

Vanadium oxides have been widely used in a variety of technological applications such electrochromic devices as infrared detectors and are expected as a material suitable for gas sensing applications. Thin films of Vanadium oxide (VOx) have been deposited by r.f magnetron sputtering under different oxygen partial pressure ratios(0%, 10%) and substrate temperatures(27℃, 400℃). Humidity-sensitive properties of resistive sensors having interdigitated electrode structure are characterized. Our sensors show good response to humidity over 20%RH to 80%RH Vanadium oxide films deposited with 0%O2 partial pressure at 400℃ exhibit greater sensitivity to humidity change than others.

韓·日의 도구시스템과 생활시스템의 異同에 관한 연구

홍철순,이형복,김희규,김소철 慶南專門大學 1999 論文集 Vol.27 No.1

에어로빅스 운동시 부상 유발 동작의 운동 역학적 분석

정철수,신인식,현무성,배성제,김복영,이기청 한국운동역학회 1995 한국운동역학회지 Vol.5 No.1

One of the reason that the aerobic dance is popular for korean women is that it is considered as a moderate aerobic exercise. However, high rate of aerobic dance related injuries have been reported among the participants. The purpose of this study was to estimate the impulsive load to the body while performing certain aerobic dance movement. Based on the preliminary questionairs on aerobic dance injury for 210 replyees, two aerobic dance movements including Run and High Kick were identified as high injury induced movements. The impulsive loads during aerobic dance estimated were joint angular acceleration and the vertical ground reaction force. The joint angular acceleration was determined using a 3-D cinematography technique, and the ground reaction force was measured with using an AMTI force platform system. It was founded that : the peak vertical ground reaction force 1738.7±171.2N, 1990.9±134.9N for Run, High Kick respectively. The peak vertical ground reaction force during High kick movement reached 3.7 body weight, which exceeded 3 body weight of force that can be experienced during jogging. These results indicates that although the aerobic dance movements look moderate means of exercise, certain movement ca produce highly impulsive look to the body and can aggravate injury when the movement is, kept repeated faster than the speed of healing process.

퍼머제의 중금속 농도에 관한 연구

윤복연,문덕환,박명희,황용식,함성애,손병철,김대환,이창희,김휘동,이채언 인제대학교 백병원 2002 仁濟醫學 Vol.23 No.5

Objective : This study was conducted to prepare the fundamental data on heavy metal concentration in hair permanents agents and to prevent the health impairment due to heavy metal. Methods and Material : The author determined of 5 heavy metals(Pb, Cr, Mn, Ni, and Cu) concentration hair permanent agents in the market with flameless atomic absorption spectrophotometer. Results : The results were as follows: 1. The geometic mean concentrations of total subjects were 0.04㎍/g for Pb, 0.09㎍/g for Cr, 0.06㎍/g for Mn, 0.03㎍/g for Ni, and 0.04㎍/g for Cu. 2. The most highest mean concentrations of heavy metals in hair permanent agents by using type were Cr for wave agent and straight cream agent, Cu for setting iron agent, Cr and Cu for coating perm agent. 3. Metal most hlghest mean concentrations of heavy in hair permanent agents by type of color was green for Cu. 4. The mean concentration of Cu among 5 heavy metals in hair permanent agents by marker was most highest. 5. There was most statistically significant difference on mean concentration in hair permanent agents between domestic and foreign products. 6. The exposure amount of heavy metal concentration by one time using the permanent agent were 4.O㎍ for Pb, 9.O㎍ for Cr, 6.0㎍ for Mn, 3.O㎍ for Ni and 4.0㎍ for Cu. Conclusion : As above results author suggest to prepare the preventive program of health impairment due to heavy metal by long term chronic exposure to who were using the hair permanent agents hair designer and customers.

CMP 공정에서 결함밀도 감소를 위한 POU 슬러리 필터의 특성과 탈이온수의 고분사법에 의한 패드수명의 개선

박성우,김철복,정소영,서용진 대불대학교 2001 論文集 Vol.7 No.1

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gets thinner, micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1 ㎛ in size, which could cause micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5 ㎛ point of use (POU) filter, which is depth-type filter and has 80% filtering efficiency for the 1.0 ㎛ size particle. In this paper, we have studied the relationship between defect generation and polished wafer counts to understand the exact efficiency of the slurry filtration, and to find out the appropriated pad usage. Our experimental results of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects, and it is impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the slurry flow rate, and to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of depth type filter.