http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
방전플라즈마 소결법에 의해 제조된 Mo 타겟의 스퍼터링 특성평가
김민정 ( Min Jung Kim ),양준모 ( Jun Mo Yang ),유정호 ( Jung Ho Yoo ),정칠성 ( Chil Sung Jeong ),박현국 ( Ik Hyun Oh ),오익현 ( Hyun Kuk Park ),이갑호 ( Kap Ho Lee ) 대한금속재료학회(구 대한금속학회) 2013 대한금속·재료학회지 Vol.51 No.8
The microstuructural properties and electrical characteristics of sputtering films deposited with Mo targets prepared by commercial hot isostatic pressing (HIP) and spark plasma sintering (SPS) were compared and analyzed. The analysis results revealed that the Mo films obtained from the SPS Mo targets had a quite similar resistivity and microstructure as the commercial HIP ones. Further, characteristics of the Mo films according to the sputtering conditions were investigated by XRD, SIMS and TEM techniques. Such films are expected to be used as electrode materials for display/solar cell devices. (Received October 29, 2012)