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아연을 코팅한 테프론 기판 위에 성장된 산화아연 박막의 후열처리 효과
김익현 ( Ik Hyun Kim ),남기웅 ( Gi Woong Nam ),이철언 ( Cheol Eon Lee ),김동완 ( Dong Whan Kim ),최현광 ( Hyon Kwang Choi ),김양수 ( Yang Soo Kim ),김진수 ( Jin Soo Kim ),김종수 ( Jong Su Kim ),손정식 ( Jeong-sik Son ),임재영 ( Ja 대한금속재료학회(구 대한금속학회) 2015 대한금속·재료학회지 Vol.53 No.6
ZnO thin films were first grown on Zn-coated Teflon substrates using a spin-coating method, with various post-heating temperatures. The structural and optical properties of the ZnO thin films were then investigated using field-effect scanning-electron microscopy, X-ray diffractometry, and photoluminescence (PL) spectroscopy. The surface morphology of these ZnO thin films exhibited dendritic structures. With increasing post-heating temperature, all samples preferentially exhibited preferential c-axis orientation and increased residual tensile stress. All of the films exhibited preferential c-axis orientation, and the residual tensile stress of those increased with increasing post-heating temperature. The near-band-edge emission (NBE) peaks were red-shifted after post-heating treatment at 400 ℃. The intensity of the deep-level emission (DLE) peaks gradually decreased with increasing post- heating temperature. Moreover, the narrowest ‘full width at half maximum’ (FWHM) and the highest intensity ratio of the NBE to the DLE for thin films, were observed after post-heating at 400 ℃. The ZnO thin films fabricated with the 400 ℃ post-heating process provided the highest crystallinity and optical properties.(Received March 04, 2014)