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SPM을 이용한 반도체 포토레지스트 제거 공정 대체를 위한 DIW-$O_3$ 방식 세정기술 개발
손영수,함상용,Son, Yeong-Su,Ham, Sang-Yong 한국기계연구원 2003 硏究論文集 Vol.33 No.-
Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.
항공기 운용 특성을 고려한 적정 운용 대수 산정 기준 연구
손영수,김성우,윤봉규,Son, Young-Su,Kim, Seong-Woo,Yoon, Bong-Kyoo 한국군사과학기술학회 2014 한국군사과학기술학회지 Vol.17 No.1
In this paper, we consider a method to access the number of aircraft requirement which is a strategic variable in national security. This problem becomes more important considering the F-X and KF-X project in ROKAF. Traditionally, ATO(Air Tasking Order) and fighting power index have been used to evaluate the number of aircrafts required in ROKAF. However, those methods considers static aspect of aircraft requirement. This paper deals with a model to accommodate dynamic feature of aircraft requirement using absorbing Markov chain. In conclusion, we suggest a dynamic model to evaluate the number of aircrafts required with key decision variables such as destroying rate, failure rate and repair rate.
손영수,고훈,한호현,이덕웅,신용태,Son Young-Soo,Ko Hoon,Han Han-Hyeon,Rhee Ducg-Woong,Shin Yong-Tae 한국통신학회 2006 韓國通信學會論文誌 Vol.31 No.3b
미래 핵심인 SW산업의 국제 경쟁력 확보를 위하여, SW 분야의 세계적인 기술변화에 대응하고 향후 SW 산업의 분석 및 설계를 주도할 아키텍트 수준의 SW 기술 인력 양성이 요구된다. 그러나 현재의 상황은 일정 수준의 경력에 따른 SW 기술 인력이 일반관리자로 전직하는 경향을 보이고 있다. 이러한 현실을 해결하고 SW 기술 인력의 질적 수준을 제고하기 위해서 국내 SW 기술 인력의 체계적이고 효과적인 성장방향을 제시하는 것이 필요하다. 따라서 본 논문에서는 국내 SW 기술 인력의 체계적이고 효과적인 성장방향을 제시하면서, 고급 SW 분석/설계 인력의 경력 경로를 제시하며 이를 실현할 수 있는 방만을 제시하고자 한다. For guaranteeing the international competitive power of SW industry that is the core industry for the future, the training of SW technical manpower as an architect is needed. They must confront the change of worldwide technology and also lead the design and analysis of SW industry for the future. However, SW technical manpower based on regular career tends to change his employment as a general manager in current status. For solve this situation and reconsider the quality level of SW technical manpower, we need to propose the systematic and effective growth direction for them. Therefore, we propose the systematic and effective growth direction for domestic SW technical manpower and a plan to be realized by suggesting the carrier path of high level SW analysis/design manpower in this paper.
손영수,고훈,신용태,Son Yong-Soo,Ko Hoon,Shin Yong-Tae 한국통신학회 2006 韓國通信學會論文誌 Vol.31 No.8B
기술개발에 대한 적절한 평가를 실시하는 것은 매우 중요하며, 기술평가가 기술개발 활동과 일체화하여 정착될 필요가 있다. 이에 본 논문의 목적은 프로젝트를 수행하는 데 있어서 업체들이 제안한 내용들이 기술 분야에 대해서 요구사항과의 적합성을 판단한다. 그리고 이에 대한 데이터를 추정하도록 한다. 그래서 추정된 값을 TEPM(Technology Evaluation Process Model)에 이용하여 최적의 업체 선정 방법을 검증하였다. It is important for evaluation execution about technology development. And it is necessary to settle together with technology development activity to evaluation execution. Purpose of this paper is to decide request for proposal and suitable to proposed enterprise contents about technology part in performance. Therefore let estimate the data about it. So suitable enterprise is selected through applying evaluation data to TEPM(Technology Evaluation Process Model).
손영수,함상용,김병인,이성휘,Son, Young-Su,Ham, Sang-Yong,Kim, Byoung-Inn,Lee, Sung-Hwee 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.11
The realization of the photoresist(PR) removal method with vaporized water and ozone gas mixture has been studied for the LCD TFT array manufacturing. The developed PR stripper uses the water boundary layer control method based on the high concentration ozone production technology. We develop the prototype of PR stripper and experiment to find the optimal process parameter condition like as the ozone gas flow/concentration, process reaction time and thin boundary layer formation. As a results, we realize the LCD PR strip rate over the 0.4 ${\mu}m/min$ and this PR removal rate is more than 5 times higher than the conventional immersion type ozonized water process.