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신석윤,함기열,전희영,박진규,장우출,전형탁,Shin, Seokyoon,Ham, Giyul,Jeon, Heeyoung,Park, Jingyu,Jang, Woochool,Jeon, Hyeongtag 한국재료학회 2013 한국재료학회지 Vol.23 No.8
Atomic layer deposition(ALD) is a promising deposition method and has been studied and used in many different areas, such as displays, semiconductors, batteries, and solar cells. This method, which is based on a self-limiting growth mechanism, facilitates precise control of film thickness at an atomic level and enables deposition on large and three dimensionally complex surfaces. For instance, ALD technology is very useful for 3D and high aspect ratio structures such as dynamic random access memory(DRAM) and other non-volatile memories(NVMs). In addition, a variety of materials can be deposited using ALD, oxides, nitrides, sulfides, metals, and so on. In conventional ALD, the source and reactant are pulsed into the reaction chamber alternately, one at a time, separated by purging or evacuation periods. Thermal ALD and metal organic ALD are also used, but these have their own advantages and disadvantages. Furthermore, plasma-enhanced ALD has come into the spotlight because it has more freedom in processing conditions; it uses highly reactive radicals and ions and for a wider range of material properties than the conventional thermal ALD, which uses $H_2O$ and $O_3$ as an oxygen reactant. However, the throughput is still a challenge for a current time divided ALD system. Therefore, a new concept of ALD, fast ALD or spatial ALD, which separate half-reactions spatially, has been extensively under development. In this paper, we reviewed these various kinds of ALD equipment, possible materials using ALD, and recent ALD research applications mainly focused on materials required in microelectronics.
LFR 태양열발전과 PV 발전시스템의 경제성 비교분석 연구
김하늘(Haneol Kim),박진규(Jingyu Park),이상남(Sangnam Lee),김종규(Jongkyu Kim) 한국신재생에너지학회 2016 신재생에너지 Vol.12 No.4
In this study, power generation and an economic evaluation of photovoltaic (PV) systems and LFR thermal power plant in Riyadh, Kingdom of Saudi Arabia were performed using the SAM program provided by NREL (National Renewable Energy Laboratory) and the calculation results were compared. The designed power capacity of the two systems was 1 MWe at 12 PM on June. Three different PV commercial models were selected and the design conditions of the LFR power plant were referred to the eCare Solar Thermal Project of CNIM (Construction Industrielles Mediterrancee). In conclusion, the annual power generation of PV is higher than the LFR due to the higher solar irradiation source of POA. On the other hand, the LFR showed more power generation at June and September because of the high optical efficiency and high DNI at a circulation ratio of 10. The levelized cost of energy (LCOE) and capital cost of LFR were 45% and 54% higher than those of the PV, respectively. In the case of a 50% construction cost reduction of the LFR due to growth of the market in the future, the LCOE of LFR becomes 5% higher than the PV but the capital cost of the LFR is 8% lower than the PV.