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DRIE 시스템을 이용한 식각 공정에서 RF 소스 전력과 PR 패턴 사이즈가 깊은 Silicon Via 측벽 표면 형상에 미치는 영향 평가
김동표(Dong-Pyo Kim),김경섭(Kyung-Seob Kim),정중채(Jung-Chae Jeong) 대한전기학회 2022 전기학회논문지 Vol.71 No.1
It has been very difficult to etch deep silicon via with photo-resist (PR) during deep reactive ion etching (DRIE) process because of the erosion of PR and the formation of vertical striations. The effects of RF source power and PR pattern size were researched on the etch rate, via top size and etch depth. The PR mask patterns with 10 μm thickness were composed of 10, 20, 30 and 40 μm squares. The etch rates and the etch profiles of deep silicon vias were monitored by the cross sectional FE-SEM images. As the RF source power and PR pattern size were increased, we obtained higher etch rate and deeper etch profiles. However, we observed the vertical striations at the surface of deep silicon vias at higher RF source power.
BCl₃/Cl₂/Ar 플라즈마에서의 Na<SUB>0.5</SUB>K<SUB>0.5</SUB>NbO₃ 박막의 표면반응
김동표(Dong-Pyo Kim),엄두승(Doo-Seung Um),김관하(Gwan-Ha Kim),우종창(Jong-Chang Woo),김창일(Chang-Il Kim) 한국표면공학회 2008 한국표면공학회지 Vol.41 No.6
The etch of (Na0.5K0.5)NbO₃ (NKN) thin film was performed in BCl₃/Cl₂/Ar inductively coupled plasma. It was found that the 1sccm addition BCl3 (5%) into Cl2/Ar plasma caused a non-monotonic behavior of the NKN etch rate. The maximum etch rate of NKN was 95.3 ㎚/min at BCl₃ (1 sccm)/Cl₂ (16 sccm)/Ar (4 sccm), 800 W ICP power, 1 Pa pressure and 400 W bias power. The NKN etch rate shows a monotonic behavior a s the bias power increases. The analysis of the narrow scan spectra o f XPS for both a s-deposited and etched NKN films allowed one to assume ion assisted etch mechanism. The most probable reason for the maximum etch rate can be defined as a concurrence of chemical and physical etch pathways.
김동표 ( Dong Pyo Kim ),이주영 ( Ju Young Lee ) 한국미용학회 2007 한국미용학회지 Vol.13 No.2
It is important to interpret hair through the morphological consideration of hair root related to hair cycle in the study of pathophysiological mechanism for hair. In this regard, this study investigated its relevant documents for grasping hair cycle and the structure of hair follicle. As a result, it has been found that hair follicle was a structural unit of epithelial cells, nerve cells, cells from the liver lobe and ectoderm cells and hair shafts with color tone were created through cooperative interactions between fibroblast, keratinous-forming cells and nerve ectoderm cells in hair follicle. In addition, after conducting a microscopic analysis for the morphological characteristics of hair root part in the anagen phase of ordinary people after openly receiving the hair from ordinary people and examining the morphological structure, it has been noted that it would be hard to distinguish the tissue of hair in the early anagen phase morphologically hair, and there were no necroses of keratinous cells of inner root sheath in the hair root of ordinary people in their anagen phase. Histologically, there were eight tissue structures such as MX (matrix), ML (Melanin), HS (Hair shaft), IRSC (Inner Root Sheath cuticle), HU (Huxley` Layer), HN (Henle`s Layer), ORS (Outer Root Sheath) and CTS (Connective Tissue Sheath) and it has been assumed that these results would be the standard, in which the hair in the anagen phase could be distinguished.