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삽목 조건이 ‘설향’ 딸기의 묘소질 및 과실 수량에 미치는 영향
이상우,이용혁,홍점규,최성환,박수정,이상우 (사) 한국생물환경조절학회 2023 생물환경조절학회지 Vol.32 No.4
딸기 ‘설향’ 품종에 대해 삽목 육묘의 조건을 확립하고자 삽수 채취용 모주 선택, 삽수의 적정 엽수 및 삽목 시기를 구명하였다. 삽수 채취는 육묘장 모주와 과실 수확 후 재배 식물체에서 채취하였고, 삽수의 엽수는 0, 1, 2장 그리고 삽목 시기는 6 월 4일부터 7월 9일까지 1주일 간격으로 하였다. 육묘장 삽수와 재배 식물체 삽수의 최종 생존율은 각각 99.5%, 98.7%로높았으며, 유의적인 차이는 없었다. 근수는 육묘장 삽수에서3.1개 많았고, 관부와 잎의 생육은 차이가 없었다. 과실 수량은 육묘장 삽수와 재배 식물체 삽수에서 각각 419.2g, 428.4g 이었지만 유의적인 차이는 없었다. 삽수의 엽수별 생존율은엽수 1, 2장에서 각각 98.1%, 98.3%로 높았고, 0장은 25.3% 로 현저히 낮았다. 근수는 엽수 1, 2장에서 각각 26.0개, 26.3 개로 엽수 0장의 23.5개에 비해 많았다. 관부와 엽의 생육에서는 엽수에 따른 유의적인 차이가 없었다. 과실 수량은 엽수 1, 2장에서 각각 424.4g, 421.5g으로, 0장 396.7g 보다 많았다. 삽목 시기에 따른 삽목 후 생존율은 97.2% 이상으로 높았으며, 처리 간의 유의적인 차이는 없었다. 묘의 지하부와 지상부그리고 관부의 생육은 6월 4일과 11일 삽목에서 가장 좋았다. 과실 수량은 6월 4일, 6월 11일 삽목에서 각각 433.3g, 426.4g 으로 가장 많았으며, 삽목 시기가 가장 늦었던 7월 9일 삽목에서는 384.5g으로 적었다. 딸기 삽목용 삽수 재료는 육묘장 삽수와 과실 수확을 마친 재배 식물체 삽수 모두 가능하였고, 삽수의 적정 엽수는 최소 1장 이상 그리고 경남 지역의 삽목 시기는 6월 4일-11일이 적합하였다. This study was conducted to investigate optimal conditions for cutting propagation of the strawberry cultivar “Sulhyang” through the collection methods of cuttings (runners tips), leaf number of cuttings, and cutting time. Cuttings were collected from the mother plant in the nursery bed (MP) and plants after fruit harvest (HP); the leaf number of cuttings was 0, 1, and 2, and the cutting time was at one-week intervals from June 4 to July 9. The survival rates for MP and HP cuttings were notably high, reaching 99.5% and 98.7%, respectively, but no significant difference was found. The number of roots were higher in MP cuttings, and there was no significant difference in crown and leaf growth. The fruit yields were 419.2 and 428.4 g, for MP and HP cuttings, respectively. The survival rates according to leaf number of cuttings were 98.1% and 98.3% for 1 and 2 remaining leaves, respectively, and remarkably lower at 25.3% for no remaining leaves. The root numbers were 26.0 and 26.3 for 1 and 2 remaining leaves, respectively, compared with 23.5 for no remaining leaves, with no significant differences in crown and leaf growth. The fruit yields were 424.4 and 421.5 g for 1 and 2 remaining leaves, respectively, and 396.7 g for no remaining leaves. The survival rates according to cutting time was over 97.2% in all cutting time without any difference in each treatment. The root, shoot, and crown of the nursery plant before planting showed the best growth in the cuttings on June 4 and 11, resulting in the highest fruit yields of 433.3 and 426.4 g, respectively, with the lowest yields at 384.5 g for cutting time on July 9. Both MP and HP materials proved suitable for strawberry cuttings. The optimal leaf number for cuttings was at least 1, and the optimal cutting time in Gyeongnam area was evaluated as around June 4-11.
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MEMS 공정을 위한 여러 종류의 산화막의 잔류응력 제거 공정
이상우,김성운,이상우,김종팔,박상준,이상철,조동일,Yi, Sang-Woo,Kim, Sung-Un,Lee, Sang-Woo,Kim, Jong-Pal,Park, Sang-Jun,Lee, Sang-Chul,Cho, Dong-Il 한국센서학회 1999 센서학회지 Vol.8 No.3
Various oxide films are commonly used as a sacrificial layer or etch mask in the fabrication of microelectromechanical systems (MEMS). Large residual strain of these oxide films causes the wafer to bow, which can have detrimental effects on photolithography and other ensuing processes. This paper investigates the residual strain of tetraethoxysilane (TEOS), low temperature oxide (LTO), 7 wt% and 10 wt% phosphosilicate glass (PSG). Euler beams and a bent-beam strain sensor are used to measure the residual strain. A poly silicon layer is used as the sacrificial layer, which is selectively etched away by $XeF_2$. First, the residual strain of as-deposited films is measured, which is quite large. The residual strain of the films is also measured after annealing them not only at $500^{\circ}C$, $600^{\circ}C$, $700^{\circ}$ and $800^{\circ}C$ in $N_2$ environment for 1 hour but also at the conditions for depositing a $2\;{\mu}m$ thick polysilicon at $585^{\circ}C$ and $625^{\circ}C$. Our results show that the 7 wt% PSG is best suited as the sacrificial layer for $2\;{\mu}$ thick polysilicon processes.
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MEMS 공정을 위한 여러 종류의 산화막의 잔류응력 제거 공정
李相佑,김성운,李尙禹,김종팔,박상준,이상철,조동일 경북대학교 센서기술연구소 1998 센서技術學術大會論文集 Vol.9 No.1
Various oxide films are commonly used as a sacrificial layer or etch mask in the fabrication of microelectromechanical systems (MEMS). Large residual strain of these oxide films cause the wafer to bow, which can have detrimental effects on photolithography and other ensuing processes. This paper investigates the residual strain of tetraethoxysilane (TEOS), low temperature oxide (LTO), 7wt% and lOwt% phosphosilicate glass (PSG). Euler beams and a bent-beam strain sensor are used to measure residual strain. A polysilicon layer is used as a sacrificial layer, which is selectively etched away by XeF_(2). First, the residual strain of as-deposited films is measured, which is quite large. These films are annealed at 500℃, 600℃, 700℃ and 800℃ for 1 hour and residual strain is measured. Then, the residual strain after annealing at the conditions for depositing a 2μm thick polysilicon at 585℃ and 625℃ are also measured. Our results show that the 7wt% PSG is best suited as the sacrificial layer for 2μm thick polysilicon processes.
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李相雨 조선대학교 인문과학연구소 1997 인문과학연구 Vol.19 No.-
戱曲作品是以能구演出爲前提, 故能深入地反應出當時的社會狀況, 從作家作品里反應出的社會萬象, 有批評社會和改造警世的作用. 元代戱曲的題材大部分取材於從古流傳下來的歷史故事. 元代是民族壓迫嚴重, 社會矛盾尖銳的時期, 同時元代的統治者, 對以詞曲來諷刺社會有흔嚴格的法律限制, 所以劇作家們以歷史題材來作戱劇可회避當時嚴려的法規. 元代由於異族的侵入, 政治上邁入黑暗的時代, 經濟上的詐取科學制度的廢止及種族的岐視, 使漢人落爲最下等的地位, 對文人的묘視及迫害, 破毁了舊敎育制度及禮樂制度. 元代的雜劇家分爲前期和後期, 卽雜劇鼎成繁昌之前期和沒落而衰滅之後期. 前期的題材多以因戰爭而歌頌英雄, 階級間鬪爭的民族葛藤爲主的作品흔多. 령外作者取歷史的事實影射現世生活, 依作者的意圖而變容的作品흔多. 後期的題材大部分分爲作家及觀衆皆已熟知的題材來戱劇化的作品, 偏重在於由素材的再現來取悅觀衆的喜好.後期的作品比起前期, 創作的態度消極, 題材亦以知識分子的生活與感情及倫理爲主, 其內容及思想自失其活力.
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이상우 경기대학교 1995 論文集 Vol.37 No.-
To comply with the increasing demand of space for cultural activity, recently the importance of interior acoustic design has been emphasized. A appropriate design to incorporate various performing event has been the major consideration during the design process of auditorium, concert hall theater, and other multi-purpose spaces. This research utilized an acoustic design of auditorium in "A" university. Sound reflection and diffusion planning scheme was used to get even sound pressure level over the audience seats and expanded sound absorbing interior design for the optimum reverberation time were also suggested through the acoustic design.
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