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황보창권,박용준,K M A. Sobahan 한국물리학회 2010 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.56 No.4
We report the influence of deposition angle on the optical and the structural properties of ZrO2thin films deposited by using electron beam evaporation with oblique angle deposition (OAD). We found that the as-deposited and annealed ZrO2 films grown at an angle of 70。 were all amorphous in nature, which was different from that deposited at normal incidence. The relationships among the refractive index, porosity, and deposition angle were studied. The refractive index was seen to decrease and the porosity to increase with increasing deposition angle. The calculated in-plane birefringence of OAD ZrO2 films had a maximum value of 0.04 at a deposition angle of 70. The microstructure was also investigated by using a scanning electron microscope (SEM).
황보창권,HwangBo, Chang-Gwon 한국광학기기산업협회 2012 光學世界 Vol.137 No.-
2012년 임진년을 맞이하여 정부가 예상하는 경제 성장률은 3.7%이며 2011년의 3.8%에 이어 계속 낮은 경제 성장을 예측하고 있다. 과거 80, 90년대의 높은 경제 성장률 시대는 이미 지나갔고 앞으로는 고용 없는 낮은 성장을 예상하고 있다. 특히 유럽의 재정위기 때문에 2012년에는 불확실성이 증가하고 이에 따라 경제가 더욱 어려울 것으로 예상하고 있으므로 광학산업도 이에 따른 영향을 받을 것으로 예측할 수 있다. 그러면 각 회사들은 이 위기를 어떻게 헤쳐 나가야 하는가? 아마도 현실에 안주하지 않는 도전정신으로 다가 올 경제 위기를 새로운 발전의 기회로 만들기 위해 각 사업체들은 미래를 대비한 다양한 준비를 R&D를 통하여 진행하고 있을 것으로 보인다.
황보창권 한국광학기기산업협회 2001 光學世界 Vol.13 No.1
광통신 기술의 발달에 따라 광학 박막을 이용한 광학 소자가 많이 사용되고 있으며, 다양하고 정교한 광학소자로서 광학박막이 계속 많이 사용될 것으로 기대되고 있다. 광통신 광학박막, 파장 다중 분할 필터(WDM), 이득 평탄 필터, 파장 가변 패브리-페로 필터, 증착 방법을 소개한다.
Optical and Structural Properties of ZrO2 Thin Films Fabricated by Using Glancing Angle Deposition
황보창권,박용준,K. M. A. Sobahan 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.53 No.5
In this paper, the optical and the structural properties of ZrO2 thin lms deposited by using electron beam evaporation with a glancing angle deposition (GLAD) technique are presented. The films prepared by using the glancing angle deposition technique were highly oriented structures composed of slanted columns and voids due to the shadow effect and limited adatom diffusion. The relationships among the refractive index, the porosity and the deposition angle were studied. The results show that the refractive index decreases and the porosity increases with increasing deposition angle. The in-plane birefringence of the ZrO2 thin lms was measured and it reached a maximum value of 0.038 at a deposition angle of 70˚. The microstructure and the morphology were also investigated by using a scanning electron microscope (SEM). We found that the optical anisotropy and the microstructure of the ZrO2 thin lms could be controlled by the GLAD technique.
Optical Humidity Sensor Using a Narrow Band-Pass Filter Prepared by Glancing Angle Deposition
황보창권,Dae-Ho Chang,박용준 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.53 No.5
This paper reports a study of an optical humidity sensor which gives a sensible response to various humidity conditions. The optical humidity sensor can be obtained through nanoscale porosity variations produced by using a physical vapor deposition technique known as glancing angle deposition (GLAD). The optical humidity sensor made of narrow band-pass filter (NBPF) is fabricated by the GLAD technique. The transmittance spectrum of this sensor shifts due to a change in the effective refractive index of the porous microstructure, resulting from water-vapor adsorption/desorption at various humidity conditions. The sensitivity, the hysteresis and the response time properties of the sensor are also studied.
황보창권,강희영,김미경 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.53 No.3
Hybrid-type extreme-ultraviolet attenuated phase-shift masks are designed by using an indium tin oxide (ITO) layer in the absorber stack and a Si layer in the (Mo/Si) multilayer stack. The designs provide not only a 180 phase-shift with a low attenuated reflectance ratio (<0.1) at the 13.5-nm wavelength, but also a high deep ultraviolet inspection contrast (>90 %) at the 257-nm wavelength. The height dierence between the reflecting multilayer stack and the absorbing stack in the hybrid-type attenuated phase-shift mask designs is reduced enough to minimize the geometric shadow effect in extreme ultraviolet lithography.