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- 저자 : 최후미 (검색결과 17 건)
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제트 스프레이와 메가소닉 세정 방법을 이용한 알루미늄 도포 웨이퍼의 오염입자 제거 효율 평가
최후미,김태성,민재원,아툴쿨카르니,안영기 한국반도체디스플레이기술학회 2012 반도체디스플레이기술학회지 Vol.11 No.3
Among various wet cleaning methods, megasonic and jet spray gained their popularity in single wafer cleaning process for the efficient removal of particulate contaminants from the wafer surface. In the present study, we evaluated these two cleaning methods for particle removal efficiency (PRE) and pattern damage on the aluminum layered wafer surface. Also the effect of CO2 dissolved water in jet spray cleaning is assessed by measuring PRE. It is observed that the jet spray cleaning process is more effective in terms of PRE and pattern damage compared to megasonic cleaning and the mixing of CO2 in the water during jet sprays further increases the PRE. We believe that the outcome of the present study is useful for the semiconductor cleaning process engineers and researchers.
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용액 내 스파크 방전을 이용한 나노입자 제조 및 특성 평가
최후미,김장아,정승교,윤주호,김태성 한국입자에어로졸학회 2012 Particle and Aerosol Research Vol.8 No.1
In this study, we designed a ‘spark in liquid’ system. The spark discharge between two electrodes were used to generate particles by using sufficient temperature to evaporate a part of electrodes. The power supply system provides a continuous spark discharge by discharging of the capacitor to ionize the electrodes in liquid. The DC spark discharge system operates with 1-10 kV voltage. Processed copper and graphite rods were used to both electrodes with 1-3 mm diameter. There are several variables which can control the particle size and concentration such as gap distance between electrodes, applied voltage, operating liquid temperature, electrode type and liquid type. So we controlled these variables to confirm the change of particle size distribution and concentration of particles contained in liquid as wt%. ‘spark in liquid’ system is expected to apply nanoink by control of concentration with analysis of characteristics.
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