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자기기록헤드 제조를 위한 퍼말로이 박막의 도금에 관한 3차원 전류밀도 분포 수치모사
강탁,전상현,최녕식 대한금속재료학회(대한금속학회) 1997 대한금속·재료학회지 Vol.35 No.7
The current distribution around rectangular cathode used in permalloy plating for the production of magnetic recording head was predicted by use of boundary element method. Three dimensional grid generator was made for the calculation of complex domain. It can be also used for curved surface. Experimental data were compared with those calculated values and fairy good agreement was observed. The effect of cell geometry and auxiliary electrode on current distribution was simulated. For the plating on the circular wafer, modification of the shape of auxiliary electrode was proposed for maximization of cathode area when active area density of cathode is smaller than that of auxiliary electrode.