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조관식 인제대학교 1991 仁濟論叢 Vol.7 No.1
In the three-fluid model of the plasma consisting of electrons, positive ions, and negative ions, the threshold and the growth rate of oscillating- two - stream instability are considered analytically, incorporating a phenomenological damping term(collisional or Landau). Negative ions play the role of lowering the instability threshold, and thus enhancing the instability growth rate near the threshold, when the electron plasma wave is damped mainly by collision. On the contrary, the threshold is raised and the growth rate is lowered by negative ions, when the electron plasma wave is damped mainly by resonant particles. However, once the pump intensity far exceeds the threshold, the growth rate is not significantly influenced by negative ions.
조관식,이대영,노승탁,Jo, Gwan-Sik,Lee, Dae-Yeong,No, Seung-Tak 대한기계학회 1996 大韓機械學會論文集B Vol.20 No.4
The effectiveness of the regenerator pertaining to Stirling cycle machines is studied by analyzing the heat transfer characteristics of the oscillating flow in a tube, and a new consistent definition of the regenerator effectiveness can be expressed by the ratio of the heat transfer in axial direction (Q$\_$axial/) to that in transverse direction (Q/su w/), and its approximate form is obtained as a function of Nusselt number for practical utility. Since an approximate value of the ratio Q$\_$axial//Qsub w/ can be expressed in terms of the time-averaged rather than transient temperatures, this expression is useful to estimate the heat transfer coefficient in the Stirling machine regenerator experimentally.
BCl<sub>3</sub> 기반의 혼합가스들을 이용한 InP 고밀도 유도결합 플라즈마 식각
조관식,임완태,백인규,이제원,전민현,Cho, Guan-Sik,Lim, Wan-tae,Baek, In-Kyoo,Lee, Je-won,Jeon, Min-hyun 한국재료학회 2003 한국재료학회지 Vol.13 No.12
We studied InP etching in high density planar inductively coupled $BCl_3$and $BCl_3$/Ar plasmas(PICP). The investigated process parameters were PICP source power, RIE chuck power, chamber pressure and $BCl_3$/Ar gas composition. It was found that increase of PICP source power and RIE chuck power increased etch rate of InP, while that of chamber pressure decreased etch rate. Etched InP surface was clean and smooth (RMS roughness <2 nm) with a moderate etch rate (300-500 $\AA$/min) after the planar $BCl_3$/Ar ICP etching. It may make it possible to open a new regime of InP etching with $CH_4$$H_2$-free plasma chemistry. Some amount of Ar addition (<50%) also improved etch rates of InP, while too much Ar addition reduced etch rates of InP.
조관식,Jo, Gwan-Sik 한국과학기술단체총연합회 1999 과학과 기술 Vol.32 No.6
광공학이라고 하면 다소 생소하지만 빛을 연구하고 가르치고 응용하며 레이저를 다루는 학문이다. 인제대 광공학과는 98년 신설된 이색학과로 레이저와 광반도체 기술을 훈련해 필요한 광통신소자 제조업체에 필요한 인력을 양성하고 있다. 일본에서는 63년 도카이대학에 처음 설립되었으며 지금은 10여개 대학에서 유사한 학과를 개설하여 운영하고 있다.
음이온이 포함된 플라즈마에서 레이저광의 매개변수적 불안정
조관식 인제대학교 1993 仁濟論叢 Vol.9 No.2
This study is on the effect of negative ions on nonrelativistic parametric instabilities of an intense light in a plasma ; e.g., parametric decay instability (PDI), oscillating-two-stream instability(OTSI), stimulated Brillouin backscattering (SBBS), and stimulated Raman backscattering(SRBS). Results are presented through simple functions of the density of negative ions. The main conclusion depends on whether plasma waves damp 1) by collision between species of particles or 2) by resonant particles. Thus in the first case the above instabilities can be said to be usually enhanced, except for SBBS and SRBS with pump well exceeding the threshold which are weakened, by negative ions. On the contrary in the second case of damping, they are weakened by negative ions exce0pt for PDI and OTSI well over the threshold which are enhanced.
조관식 인제대학교 1990 仁濟論叢 Vol.6 No.1
The threshold and the growth rate of parametric decay of laser are investigated via the throe-fluid theory of the plasma consisting of electrons, positive and negative ions. Landau dampings of electrostatic waves are taken into consideration phenomenologically. The threshold is raised, and the decay process is enhanced near the threshold, while unaffected well above the threshold, by negative ions.
조관식 인제대학교 1995 仁濟論叢 Vol.11 No.2
Filamentation of an electromagnetic wave in a plasma with negative ions is treated theoretically through the collisionless three-fluid model. The threshold intensity required by the instability is raised and the growth rate above the threshold is lowered, by negative ions. After all, the filamentation instability may be said to be weakened by the presence of negative ions. However, if the pump intensity is high enough to change the plasma property, the instability growth rate may be enhanced by negative ions. The less the particle mass of negative ions relative to that of positive ions, the more prominent the enhancement.