두경부 수술 후 발생한 폐혈전색전증에 관한 연구

엄지훈,지용배,송창면,김혁,태경 대한이비인후과학회 2014 대한이비인후과학회지 두경부외과학 Vol.57 No.8

Background and Objectives Pulmonary thromboembolism (PTE) after surgery is one of the rare but fatal complications causing sudden respiratory failure. This study was performed to evaluate PTE after head and neck surgery and to report our recent experience with review of the literature. Subjects and Method We retrospectively analyzed 1096 patients who underwent head and neck surgery from January 2011 to June 2013 in a tertiary hospital. We evaluated the incidence and characteristics of PTE and risk factors of PTE such as smoking, body mass index, comorbidities, coronary artery disease, coagulation disorder and Caprini risk assessment model. Results PTE occurred in five of 1096 patients (0.46%; two were male and three were female, with a mean age of 56.2 year). All patients with PTE were categorized into high risk group of PTE by Caprini model. The mean Caprini risk score were 6.6 and 4.6 in the PTE patients and non-PTE patients, respectively. The significant risk factors were long operative time, cancer patients and high Caprini score in this study. One PTE patient underwent cardiopulmonary resuscitation due to respiratory arrest, afterwards received thromboembolectomy by thoracotomy. Four patients received anticoagulation therapy only. Conclusion Risk stratification for PTE is necessary in patients who receive long operation for head and neck cancer or have high Caprini score. Korean J Otorhinolaryngol-Head Neck Surg 2014;57(8):533-8

멀티 브랜드 비스트로, 유니온 스퀘어 미각의 글로벌 투어

엄지훈,Eom, Ji-Hun 한국주택협회 2006 주택과 사람들 Vol.197 No.-

샌프란시스코의 유니온 스퀘어가 부럽지 않다! 한식부터 스시 바까지 세계의 미각이 모여 있는 서울 한복판의 '유니온 스퀘어'에서 미각의 글로벌 투어를 떠나보자. 맛을 선택하는 즐거움이 넘친다.

재퍼니즈 & 이탈리안 퀴진, 트라이베카

엄지훈,Eom, Ji-Hun 한국주택협회 2006 주택과 사람들 Vol.199 No.-

한동안 휴식기를 가졌던 트라이베카가 한층 업그레이드된 모습으로 다시 찾아왔다. 현재 뉴요커들이 가장 열광하는 재퍼니즈 & 이탈리안 퀴진과 힙합 다이너의 인테리어를 갖춘 뉴 트라이베카가 오픈했다.

아메리칸 스타일 비스트로, 콰이민스 트리

엄지훈,Eom, Ji-Hun 한국주택협회 2006 주택과 사람들 Vol.199 No.-

최근에는 근사한 프렌치 레스토랑보다 홈메이드 요리를 내놓은 레트로한 레스토랑이 오픈한다는 소식이 더 반갑다. 일본 다이칸야마에서 갔던 미니 레스토랑을 추억하게 만드는 비스트로 ‘콰이민스 트리’를 소개한다.

Chlorine-based high density plasma etching of α-Ga2O3 epitaxy layer

엄지훈,Byoung Su Choi,Dae Hwi Jeong,Hyun-Ung Choi,황승구,Dae-Woo Jeon,김진곤,조현 대한금속·재료학회 2021 ELECTRONIC MATERIALS LETTERS Vol.17 No.2

High density plasma etching of α-Ga2O3 epitaxy layer was performed in chlorine-based (Cl2/Ar and BCl3/Ar) inductivelycoupled plasmas (ICPs) and the effect of plasma composition, ICP source power and rf chuck power on the etch rate andsurface morphology has been studied. The α-Ga2O3 etch rate increased as Cl2or BCl3content in the gas mixture and ICPsource power increased, and Cl2/Ar ICP discharges produced higher etch rates than BCl3/Ar discharges under the conditionsexamined. Increasing rf chuck power was found to increase the α-Ga2O3 etch rate and to improve surface morphology ofthe etched field. The highest etch rates of ~ 612 Å/min and ~ 603 Å/min were obtained in 13Cl2/2Ar and 13BCl3/2Ar ICPdischarges under a moderate source power (500 W) and rf chuck power (250 W) condition, respectively. Anisotropic patterntransfer with a vertical sidewall was performed into the α-Ga2O3 layer using a 10Cl2/5Ar ICP discharge.

Fluorine-based Inductively Coupled Plasma Etching of α-Ga2O3 Epitaxy Film

엄지훈,최병수,장우식,황승구,전대우,김진곤,조현 대한금속·재료학회 2021 대한금속·재료학회지 Vol.59 No.2

α-Ga2O3 has the largest bandgap (~5.3 eV) among the five polymorphs of Ga2O3 and is a promising candidate for high power electronic and optoelectronic devices. To fabricate various device structures, it is important to establish an effective dry etch process which can provide practical etch rate, smooth surface morphology and low ion-induced damage. Here, the etch characteristics of α-Ga2O3 epitaxy film were examined in two fluorine-based (CF4/Ar and SF6/Ar) inductively coupled plasmas. Under the same source power, rf chuck power and process pressure, an Ar-rich composition of CF4/Ar and an SF6-rich composition of SF6/Ar produced the highest etch rates. Monotonic increase in the etch rate was observed as the source power and rf chuck power increased in the 2CF4/13Ar discharges, and a maximum etch rate of ~855 Å/min was obtained at a 500 W source power, 250 W rf chuck power, and 2 mTorr pressure. A smooth surface morphology with normalized roughness of less than ~1.38 was achieved in the 2CF4/13Ar and 13SF6/2Ar discharges under most of the conditions examined. The features etched into the α-Ga2O3 layer using a 2CF4/ 13Ar discharge with 2 mTorr pressure showed good anisotropy with a vertical sidewall profile.

TiZrN 박막의 조성이 구조적 특성 및 열적 특성에 미치는 영향

최병수,엄지훈,석민준,이병우,김진곤,조현,Choi, Byoung Su,Um, Ji Hun,Seok, Min Jun,Lee, Byeong Woo,Kim, Jin Kon,Cho, Hyun 한국결정성장학회 2021 韓國結晶成長學會誌 Vol.31 No.1

화학적 조성이 TiZrN 박막의 구조적 특성 및 열적 특성에 미치는 영향을 조사하였다. 증착된 TixZr1-xN(x = 0.87, 0.82, 0.7, 0.6, 0.28) 박막에서 Zr 분율이 증가함에 따라 결정립 크기가 감소하고 주상 구조에서 입계상 구조로 점진적으로 변화하는 미세구조 변화가 관찰되었다. 또한 XRD 분석을 통해 Zr 분율이 0.4까지 증가할 때 TiN 상에서 TiZrN 상으로의 점진적인 결정상 전이가 일어났음을 확인하였다. 900℃ 온도에서의 열처리 이후 Ti0.82Zr0.18N과 Ti0.7Zr0.3N 박막은 rutile 상 TiO2와 TiZrO4 산화물이 공존하는 형태로 전환된 반면에 Ti0.6Zr0.4N 박막은 TiZrO4 산화물로 변화함을 확인하였다. 다섯 가지 조성의 TiZrN 박막 중에서 Ti0.6Zr0.4N 박막이 가장 우수한 고온 안정성을 나타내었고, Inconel 617 기판의 열산화에 의해 발생하는 Cr의 표면 확산을 억제하는 열산화 저항성 향상 효과가 가장 우수함을 확인하였다. The effect of chemical composition on the structural and thermal properties of TiZrN thin films was studied. As the Zr fraction in the deposited TixZr1-xN (x = 0.87, 0.82, 0.7, 0.6, and 0.28) increased, microstructural changes consisted of reduction in the grain size and a gradual transition from columnar structure to granular structure were observed. In addition, it was also confirmed that a gradual crystal phase transition from TiN to TiZrN has occurred as the Zr fraction increased up to 0.4. After heat treatment at 900℃, Ti0.82Zr0.18N and Ti0.7Zr0.3N layers were converted to a form in which rutile phase TiO2 and TiZrO4 oxides coexist, while Ti0.6Zr0.4N layer was converted to TiZrO4 oxide. Among the five compositions of TiZrN films, the Ti0.6Zr0.4N showed the best high temperature stability and produced a significant enhancement in the thermal oxidation resistance of Inconel 617 through suppressing the surface diffusion of Cr caused by thermal oxidation of the Inconel 617 substrate.

폐쇄성 수면무호흡증 환자의 주간 졸림증 및 불면증에 대한 임상 분석

김인식,엄지훈,윤형준,김동환,김경래,조석현 대한비과학회 2018 Journal of rhinology Vol.25 No.2

Background and Objectives: Sleep disturbances and excessive daytime sleepiness (EDS) are the major symptoms of obstructivesleep apnea (OSA). This study aimed to investigate clinical implications of insomnia and EDS in patients with OSAusing the Pittsburgh Sleep Quality Index (PSQI) and Epworth Sleepiness Scale (ESS). Materials and Method: We evaluated 131 subjects with suspected OSA who were undergoing polysomnography (PSG)and performing the PSQI and ESS surveys. OSA was diagnosed when the apnea-hypopnea index was five or more. EDS wasdefined when ESS score was 11 points or higher. Detailed history and questionnaire were used to categorize insomnia. We comparedclinical variables and PSG results in subgroups with or without insomnia and EDS. Results: There were no significant differences of PSQI and ESS score between controls and OSA. OSA with insomnia hadsignificantly increased total score (p<0.001) and decreased total sleep time (p=0.001) and sleep efficiency (p=0.001) on thePSQI compared to those without insomnia. OSA with EDS showed significantly increased PSQI score (p=0.022) and decreasedtotal sleep time (p=0.018) on PSG compared to those without EDS. Neither PSQI nor ESS score had a correlation with respiratoryvariables such as AHI and oxygen saturation. Total sleep time had a significant effect on both insomnia and EDS in patientswith OSA. Conclusion: Decreased total sleep time had important effects on subjective symptoms of OSA and comorbid insomnia. Therefore,restoration of decreased sleep time is important in the management of OSA.

HCl 용액을 이용한 α-Ga2O3 epitaxy 박막의 습식 식각

최병수,엄지훈,엄해지,전대우,황승구,김진곤,윤영훈,조현 한국결정성장학회 2022 한국결정성장학회지 Vol.32 No.1

Wet etching of α-Ga2O3 epitaxy film was performed using a 35 % hydrochloric (HCl) acid solution. As the temperature of the 35 % HCl solution increased, the α-Ga2O3 etch rate increased, and the etch rate of 119.6 nm/min was obtained at 75°C, the highest temperature examined in this work. The activation energy for etch reaction was determined to be 0.776 eV, and this suggests that the wet etching of α-Ga2O3 in the 35 % HCl solution was dominated by the reactionlimited mechanism. AFM analysis showed that the surface roughness of the etched surface increased as the temperature of the etchant solution increased. 35 % 농도의 염산 용액을 이용하여 α-Ga2O3 epitaxy 박막의 습식 식각을 수행하였다. 35 % 염산 용액의 온도가 증가함에 따라 α-Ga2O3 epitaxy 박막의 식각 속도가 증가하였고, 본 연구에서 시도한 가장 높은 온도인 75°C에서 119.6 nm/min의 식각 속도를 나타내었다. 식각 반응의 활성화 에너지는 0.776 eV로 계산되었고, HCl 용액에서의 습식 식각은 reactionlimited 반응 기구에 의해 지배됨을 확인하였다. 각 온도에서 식각된 표면들의 AFM 분석결과 식각 용액의 온도가 증가함에 따라 식각된 표면의 표면조도가 증가함을 알 수 있었다.

인후두 역류증의 약물요법에 적절한 약제 및 치료기간의 선택

이윤재,곽민규,엄지훈,지용배,송창면,태경 대한이비인후과학회 2014 대한이비인후과학회지 두경부외과학 Vol.57 No.10

Background and Objectives Various drugs can be used for treatment of laryngopharyngeal reflux disease (LPRD). However, the optimal medical treatment regimen is still controversial. This study was performed to determine the optimal medical treatment regimen and duration for LPRD. Subjects and Method We studied 172 patients who were diagnosed as LPRD by reflux symptom index (RSI) or reflux finding scores (RFS). The study group was divided into 4 groups according to the medication regimen: proton pump inhibitor (PPI), PPI and prokinetics, PPI and H2 blocker, and double dose PPI groups. All patients took medicines for 3 months or more. Clinical remission was defined as 70% improvement of initial RSI scores. Results 36 (20.9%) patients were prescribed PPI only, 65 (37.8%) patients PPI with prokinetics, 51 (29.6%) patients PPI with H2 blocker, 20 (11.6%) patients double dose PPI. Pretreatment with RSI and RFS did not differ among the four groups. RSI was improved after one month of medication in all of the groups. RSI and RFS tended to decrease during the treatment in all groups (p for trend <0.001). The mean clinical remission time was 2.3 months in patients receiving PPI alone, 2.6 months in PPI and prokinetics group, 2.5 months in the PPI and H2 blocker group and 1.8 months in the double dose PPI group. About 70% of patients reached clinical remission within 3 months. Conclusion PPI with or without prokinetics or H2 blocker is effective treatment for LPRD, and the appropriate duration of medication seems to be about 3 months. Double dose PPI can be used for those whom normal dose PPI is ineffective. Korean J Otorhinolaryngol-Head Neck Surg 2014;57(10):698-702