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실리콘 연마에서 패드 버핑 공정이 연마특성에 미치는 영향
박기현,정해도,박재홍,마사하루키노시타,Park, Ki-Hyun,Jeong, Hae-Do,Park, Jae-Hong,Kinoshita, Masaharu 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.4
This paper investigated the effect of the pad buffing process on the material removal characteristics and pad stabilization during silicon chemical mechanical polishing. The pads surface were controlled by the buffing process using a buffer made by the sandpaper. The buffing process is based on abrasive machining by using a high speed sandpaper. The controlled pad by the buffing process show less deformation deviation and stable material removal rate during the CMP process. In addition, the controlled pad ensure better uniformity of removal rate than comparative pads. As a result of monitoring, the controlled pad by the buffing process demonstrated constant and stable friction force signals from initial polishing stage. Therefore, the tufting process could control the pad surface to be uniform and improve the performance of the polishing pad.
오타 긴죠(大田錦城)의 경학經學에 관해서- 에도의 절충학折衷學과 청대淸代의 한송겸채학漢宋兼採學-
미즈카미 마사하루 재단법인다산학술문화재단 2007 다산학 Vol.- No.11
OTA Kinjo(1765~1825) was a famous Japanese evidential scholar of Confucius classics. Although he advocated Han- and Song-Learning syncretism, most scholars who studied about him have thus far focused on his accomplishment in evidential research. This paper casts light on Kinjo’s syncretism by comparing the scholarship of Kinjo with that of contemporary Chinese scholars of the 18th century who are regarded to have advocated Han- and Song-Learning syncretism. Through careful consideration, the following results have been obtained: (1) Contemporary evidential scholars regarded as advocates of Han- and Song-Learning syncretism in China are not actually eclectic, because they scarcely mention the writings of Song scholars and they reject the philosophical orientation toward the Classics which the scholars advocating Song-Learning were in favor of. (2) On the other hands, Kinjo often mentioned the writings of the Song scholars and was much interested in the topics they dealt with. His learning deserves to be counted as “Han- and Song-Learning syncretism.” (3) The learning of Kinjo has many common characteristics with that of the scholars in the early Qing era. One factor of that is that he could read few writings of contemporary(mid-Qing) scholars, although he could read many writings of early Qing scholars.
W CMP 공정에서의 연마패드표면 안정화 상태와 그 개선
박재홍,키노시타 마사하루,요시다 코이치,신이치 마츠무라,정해도,Park, Jae-Hong,Kinoshita, Masaharu,Yoshida, Koichi,Matsumura, Shinichi,Jeong, Hae-Do 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.12
In this research, the polishing pad for W CMP has been analyzed to understand stabilization of polishing performance. For stabilization of process, the polishing pad condition is one of important factors. The polishing pad plays a key role in polishing process, because it contact with reacted surface of wafer[1]. The physical property of pad surface is ruled by conditioning tool which makes roughness and profile of pad surface. Pad surface affects on polishing performance such as RR(Removal Rate) and uniformity in CMP. The stabilized pad surface has stable roughness. And its surface has high level of wettability which can increase the probability of abrasive adhesion on pad. The result of this research is that the reduction of break-in and dummy polishing process were achieved by artificial machining to make stable pad surface. In this research, urethane polishing pad which is named IC pad(Nitta-Haas Inc.) and has micro pore structure, is studied. Because, this type of pad is the most conventional type.