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환경변화 요인에 따른 결정질 실리콘 태양전지모듈의 최대출력 특성 분석
강기환,김경수,박지홍,유권종,안형근,한득영 한국태양에너지학회 2007 한국태양에너지학회 논문집 Vol.27 No.3
In this study, we analyzed the maximum output power characteristics of crystalline silicon photovoltaic module by change of environmental effects. The electrical, optical and thermal property of PV modules were investigated during outdoor test period about 70 days. There was a fluctuation in maximum output power by change in transmittance caused by environment effects like rain, snow and dust. The effects of external environmental change were analyzed using climate data. Also local thermal temperature variation and transmittance imbalance on surface of PV module which might lead degradation of constituent material were detected using infrared camera. The further analysis is describe in the following paper.
강기환,고석환,정영석 한국태양광발전학회 2015 한국태양광발전학회지 Vol.1 No.1
태양광발전시스템 기술은 태양광모듈-접속함-PCS가 포함되는 BOS 기술로부터 시작되어 독립형 또는 계통연계형으로 전력을 생산하게 하는 설치, 운전, 운영기술이 모두 포함된다. 태양광 밸류체인 기술마다 급속한 산업 성장으로 단가경쟁력이 치열한 요즘 태양광발전시스템 기술은 설치단가, 발전단가를 낮출 수 있는 최후의 마지막 수단이라고 생각하고 시스템 설치단가, 운영단가를 낮추기 위해 많은 연구를 수행 중에 있다. 그러나, 태양광발전시스템 기술이 정상적으로 완성되지 못하면 경제적 손실은 물론, 내구성능과 수명, 민원에 의한 분쟁, 사고 등 다양한 고통을 겪게 된다. 본고에서는 이러한 태양광발전시스템에 대한 다양한 고장 사례와 민원 분쟁 유형을 진단하고, 그에 대한 해결방안을 제시하고자 한다.
Pyrosol법에 의한 SnO₂ : F박막의 전기광학적 특성 F Thin Films Prepared by Pyrosol Method
姜埼煥 건국대학교 1994 論文集 Vol.9 No.-
Fluorine-doped SnO₂ (SnO₂ : F) films were prepared in the ordinary atmosphere on Corning 7059 glass substrates by pyrosol deposition method from the solutions SnCl₄ㆍ5H₂O, NH₄F, CH₃OH, H₂O, and HCl under the experimental condition of substrate temperature 425[℃], F/Sn 3 wt%, and air flow rate 10[ℓ/min]. These films have good electrooptical properties such like a resistivity of 4.3 × 10^(-4)[Ωcm] and specular transmittance of 78%. In an attempt to develop optimum transparent electrodes for amorphous silicon solar cells durable against hydrogen plasma, the films were prepared by pyrosol deposition method when varying only the CH₃OH/ H₂O mol ratio in the mixtures of SnCl₄ㆍ5H₂O, NH₄F, CH₃OH, H₂O, and HCl under the following conditions : substrate temperature of 200[℃], H2 Pressure of 1[Torr], RF input power of 50[mW/㎠], H₂ flow rate of 30 [cc/min] and exposure time of 15∼600[sec). It is found that sheet resistances of the films remain unchanged or slightly reduced after initial exposure of 30∼60[sec], regardless of the CH₃OH/H₂O mot ratio, but increase sharply with increasing the H₂plasma exposure time. Optical transmittances of the films degrade, in general, very sharply with increasing the exposure time. However, a film obtained from a solution of CH₃OH/H₂O mol ratio of 2.65 showed a lowest fall of 7∼15% within the exposure time of 30∼60 [sec]. In addition, the exposure of the films to hydrogen plasma atmosphere leads to remarkable changes in the microstructure and chemical composition, which should be originated from the reduction of SnO₂ to SnO and to elemental Sn.