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Field electron emission from amorphous carbon thin films grown by RF magnetron sputtering
Jeong-Tak Ryu,Shin-Ichi Honda,Mitsuhiro Katayama,Kenjiro Oura 한국물리학회 2005 Current Applied Physics Vol.5 No.4
Using a RF magnetron sputtering, amorphous carbon (a-C) and N-doped a-C (a-C:N) thin lms were fabricated as eld electronemitter. These thin lms were deposited on Si(001) substrate at several temperatures. The eld emission property was improved fora-C thin lms grown at higher substrate temperatures. Furthermore, a-C:N lm exhibits eld emission property better than that ofundoped a-C lm. These results are explained in terms of the change in surface morphology and structural properties of a-C lm..