http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Schnauber, Peter,Schall, Johannes,Bounouar, Samir,Hö,hne, Theresa,Park, Suk-In,Ryu, Geun-Hwan,Heindel, Tobias,Burger, Sven,Song, Jin-Dong,Rodt, Sven,Reitzenstein, Stephan American Chemical Society 2018 NANO LETTERS Vol.18 No.4
<P>The development of multinode quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates, and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of preselected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multimode interference beamsplitter via in situ electron beam lithography. We demonstrate the combined emitter-gate interface functionality by measuring triggered single-photon emission on-chip with <I>g</I><SUP>(2)</SUP>(0) = 0.13 ± 0.02. Due to its high patterning resolution as well as spectral and spatial control, in situ electron beam lithography allows for integration of preselected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way toward multinode, fully integrated quantum photonic chips.</P> [FIG OMISSION]</BR>