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Joonkon Kim,Chulhun Eum,Wan Hong 한국물리학회 2003 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.43 No.42
During ion-beam irradiation, an electric potential is induced on the surface of an insulator sample owing to electric charge buildup. Because this uncontrollable built-up voltage causes energy uctuations of the incoming ions and the exiting charged particles, the uncertainty in ion-beam analyses, such as Rutherford backscattering spectrometry and elastic recoil detection increases. In order to suppress the charge buildup eect, we deposited a thin gold lm on the sample surface. Using a He beam, and measured the built-up voltage at the insulator surface as a function of the Au film thickness. We determined the minimum thickness necessary to suppress such an effect for several insulators samples.