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co-sputtering 시스템의 증착조건에 따른 MgZnO 박막의 조성 특성에 관한 연구
손지훈(Ji-hoon Son),성효성(Hyo-seung Seung),김우성(Woo-sung Kim),장낙원(Nak-won Jang) 한국마린엔지니어링학회 2010 한국마린엔지니어링학회 학술대회 논문집 Vol.2010 No.4
In this paper, we have investigated about MgZnO thin films on Si(100) substrate by RF magnetron co-sputtering system. MgZnO thin films were affected by RF input power of each target, gas pressure, gas composition, and substrate temperatures. So, we focused on most effective RF input power of each target in deposition condition. Thickness of MgZnO thin films was measured by surface profiler. And structural analysis carried out by X-ray Diffraction(XRD), content of Mg in MgZnO thin films was measured by energy dispersive spectroscopy(EDS). Physical characteristics and content of Mg in MgZnO thin films changed with RF input power.