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이학주(H. J. Lee),최병익(B. I. Choi),김완두(W. D. Kim),오충석(C. S. Oh),한승우(S. W. Han),허신(S. Hur),김재현(J. H. Kim),고순규(S. G. Ko),안현균(H. G. Ahn) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.4
There are many applications of nanostructures, have been suggested by lots of researchers. It is<br/> highly required to measure the properties of nano-sized materials for design and fabrication of the<br/> nanostructures. In this paper, several techniques for measuring the mechanical properties of<br/> nano-structures are presented laying emphasis on the activity of Nano Property Measurement Team in<br/> KIMM. Some advanced applications of nano-indenter are described for measuring elastic, visco-elastic,<br/> frictional and adhesive properties as well as the standard methods of it. Micro-tensile test technique<br/> with accurate in-plane strain measurement method is also presented and its role in the property<br/> measurement of nanostructures is discussed.
유한요소해석을 이용한 연성재료의 나노인덴테이션에 관한 연구
한승우(S. W. Han),이현우(H. W. Lee),이학주(H. J. Lee),고순규(S. G. Ko),김재현(J. H. Kim) 대한기계학회 2004 대한기계학회 춘추학술대회 Vol.2004 No.4
Nano-indentation is used for measuring mechanical properties of thin films such as elastic modulus and hardness. For ductile materials, pile-up around the indenter causes the calculation of inaccurate projected contact area. This phenomenon was found by measurement of indentation shape using an atomic force microscope. In present study finite element analysis of nano-indentation was performed to compensate the effects of pile-up on the contact area. The result of finite element analysis was compared with that of nano-indentation for a ductile material. The analysis has demonstrated that the true contact area is greater than that calculated by nano-indentation. It is verified that the consideration of the effects of pile-up in nanoindentation for ductile materials using the finite element method is reasonable.
나노인덴테이션을 이용한 나노 임프린트된 폴리머 박막의 잔류두께 측정기법
이학주(H.J. Lee),고순규(S.G. Ko),김재현(J.H. Kim),허 신(S. Hur),이응숙(E.S. Lee),정준호(J.H. Jeong) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
Nano-imprint technology has been vigorously studied by many researchers for it is one of the<br/> most promising technologies for manufacturing the pattern with its critical dimension below 100nm. In<br/> the nano-imprint technology, nano patterns are transferred on a polymer film and the transferred<br/> patterns are used as an etch mask to define the designed patterns on a substrate or a metal layer. To<br/> this end, it is important to keep the residual thickness of the imprinted polymer film uniform. In this<br/> study, a novel measurement technique to measure the residual thickness of films is proposed based on<br/> nanoindentation theory. This technique has advantages of saving time and measuring the residual<br/> thickness of highly-localized portions in comparison with other techniques, but has limitation of<br/> requiring calibration process.