We have fabricated perpendicular magnetic tunnel junctions (pMTJs) with a CoFeB/ TbFeCo pinned layer and Ta/ CoFeB/ MgO free layer using in-situ annealing process. The TbFeCo-based hybrid pinned layer is a useful approach to obtain a high perpendicula...
We have fabricated perpendicular magnetic tunnel junctions (pMTJs) with a CoFeB/ TbFeCo pinned layer and Ta/ CoFeB/ MgO free layer using in-situ annealing process. The TbFeCo-based hybrid pinned layer is a useful approach to obtain a high perpendicular magnetic anisotropy (PMA). However, a high temperature annealing, often required for MgO-based MTJs to obtain a high tunneling magnetoresistance (TMR), may deteriorate the PMA of TbFeCo films. Our experimental results show a possibility to obtain a reasonable TMR and high PMA simultaneously by conducting an annealing process to achieve a grain-to-grain epitaxy in CoFeB/MgO/CoFeB layers before depositing the TbFeCo layer. The pMTJs prepared by this process show a tunneling magnetoresistance (TMR) ratio of 15% to 19 % at room temperature.