Vacuum packaged electromagnetic 2D scanning micromirror

다국어 초록 (Multilingual Abstract)

<P><B>Abstract</B></P> <P>We herein present the design, fabrication, and wafer-level packaging of an electromagnetic biaxial scanning micromirror. The vacuum packaging of the micromirror was implemented by anodically bonding the glass cap wafer to both sides of the silicon substrate with the micromirror. The measured quality factor of the vacuum packaged micromirror is 1923.2 for the horizontal scan, whereas that of the device in the air is 649.6. The maximum optical scan angle of the vacuum packaged micromirror is 24.19° at 155 mApp and 11.9 kHz for the horizontal scan, and 7.1° at 204.7 mApp and 60 Hz for the vertical scan. The estimated vacuum level of the package is 1.65 ± 0.85 Torr.</P> <P><B>Highlights</B></P> <P> <UL> <LI> The design, fabrication, and wafer-level packaging of an electromagnetic biaxial scanning micromirror is presented. </LI> <LI> The vacuum packaging was implemented by anodically bonding the glass cap wafer to both sides of the micromirror. </LI> <LI> The quality factor of the packaged mirror is 1923 for the horizontal scan, whereas that of the device in the air is 649.6. </LI> <LI> The estimated vacuum level of the package is 1.65 ± 0.85 Torr. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>Perspective view of the vacuum-packaged micromirror.</P> <P>[DISPLAY OMISSION]</P>