TiN thin films were deposited on to mirror-like polished stainless steel by ion beam assisted deposition (IBAD) method. The deposition characteristics of TiN films were invested by various analysis method - Color Test, XRD, AES and Scratch Tester. The...
TiN thin films were deposited on to mirror-like polished stainless steel by ion beam assisted deposition (IBAD) method. The deposition characteristics of TiN films were invested by various analysis method - Color Test, XRD, AES and Scratch Tester. The SEM analysis showed that the morphologies of TiN films were changed with smooth surface as according to the increasing of the ion arrival ratios. From the AES analysis, TiN films were confirmed only the composition of Ti and N. The ratios of the composition N/Ti were increased as according to the increasing of ion energy per atom. The TiN thin films have a strong preferred orientation of (lll) crystallographic plane. The color of films is golden yellow above 600 eV/A. The adhesion of films were decreased as according to the increasing of ion energy per atom, but the values of adhesion were excellent as the above 18 N and the maximum value was 38 N at l of the ratio of the composition N/Ti.