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      KCI등재후보 SCIE SCOPUS

      A New Semi-Empirical Model for the Backgating Effect on the Depletion Width Modulation in GaAs MESFET's

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      https://www.riss.kr/link?id=A76266956

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      다국어 초록 (Multilingual Abstract)

      A simple and efficient way of modeling backgating in GaAs MESFET's is presented through depletion width modulation of Schottky junction and channel-substrate interface. It is shown semi-empirically that such a modulation of depletion widths causes ser...

      A simple and efficient way of modeling backgating in GaAs MESFET's is presented through depletion width modulation of Schottky junction and channel-substrate interface. It is shown semi-empirically that such a modulation of depletion widths causes serious troubles in designing precision circuits since backgating drastically reduces threshold voltage of MESFET as well as drain current. Finally, some of the results are compared with reported experimental results. This model may serve as a starting point for rigorous characterization of backgating effect on various device parameters of GaAs MESFET's.

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      목차 (Table of Contents)

      • Abstract
      • Ⅰ. INTRODUCTION
      • Ⅱ. THEORETICAL MODEL
      • Ⅲ. RESULTS
      • Ⅳ. CONCLUSIONS
      • Abstract
      • Ⅰ. INTRODUCTION
      • Ⅱ. THEORETICAL MODEL
      • Ⅲ. RESULTS
      • Ⅳ. CONCLUSIONS
      • APPENDIX
      • REFERENCES
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      참고문헌 (Reference)

      1 E. B. Stoneham, "Working with nine different foundries" 11-14, 1990

      2 Y. H. Chen, "Threshold behavior in backgating in metalsemiconductor field effect transistor: Induced by limitation of channel-substrate junction to leakage current" 81 : 511-515, 1997

      3 J. Wu, "Sidegating effect on Schottky contact in ionimplanted GaAs" 78 : 7422-7423, 1995

      4 S. M. Sze, "Physics of Semiconductor Devices 2nd ed" Wiley 1999

      5 Y. Ohno, "Mechanism of electrostatic potential conduction in semi insulating substrates" 66 : 1217-1221, 1990

      6 R. Anholt, "Mechanism of EL2 effects on GaAs field-effect transistor threshold voltages" 62 : 3995-3997, 1987

      7 Michael Shur, "GaAs Devices and Circuits" Plenum press 1986

      8 K. Shenai, "Channel-buffer (substrate) interface phenomenon in GaAs MESFET’s fabricated by molecular-beam epitaxy" 35 : 590-603, 1988

      9 A. E. Bond, "Backgating reduction in MESFETs using an AlAs native oxide buffer layer" 32 : 2271-2273, 1996

      10 C. Kocot, "Backgating in GaAs MESFET’s" 30 : 963-968, 1982

      1 E. B. Stoneham, "Working with nine different foundries" 11-14, 1990

      2 Y. H. Chen, "Threshold behavior in backgating in metalsemiconductor field effect transistor: Induced by limitation of channel-substrate junction to leakage current" 81 : 511-515, 1997

      3 J. Wu, "Sidegating effect on Schottky contact in ionimplanted GaAs" 78 : 7422-7423, 1995

      4 S. M. Sze, "Physics of Semiconductor Devices 2nd ed" Wiley 1999

      5 Y. Ohno, "Mechanism of electrostatic potential conduction in semi insulating substrates" 66 : 1217-1221, 1990

      6 R. Anholt, "Mechanism of EL2 effects on GaAs field-effect transistor threshold voltages" 62 : 3995-3997, 1987

      7 Michael Shur, "GaAs Devices and Circuits" Plenum press 1986

      8 K. Shenai, "Channel-buffer (substrate) interface phenomenon in GaAs MESFET’s fabricated by molecular-beam epitaxy" 35 : 590-603, 1988

      9 A. E. Bond, "Backgating reduction in MESFETs using an AlAs native oxide buffer layer" 32 : 2271-2273, 1996

      10 C. Kocot, "Backgating in GaAs MESFET’s" 30 : 963-968, 1982

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2014-01-21 학회명변경 영문명 : The Institute Of Electronics Engineers Of Korea -> The Institute of Electronics and Information Engineers KCI등재
      2010-11-25 학술지명변경 한글명 : JOURNAL OF SEMICONDUTOR TECHNOLOGY AND SCIENCE -> JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE KCI등재
      2010-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2009-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2007-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.42 0.13 0.35
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
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