ISPM 및 PBMS를 이용한 BPSG 및 PSG CVD 공정 중발생하는 오염입자의 실시간 측정 = Real-time Contaminant Particle Monitoring for Chemical Vapor Deposition of Borophosphosilicate and Phosphosilicate Glass Film by using In-situ Particle Monitor and Particle Beam Mass Spectrometer

다국어 초록 (Multilingual Abstract)

In this study, we investigated the particle formation during the deposition of borophosphosilicate glass (BPSG) and phosphosilicate glass (PSG) films in thermal chemical vapor deposition reactor using in-situ particle monitor (ISPM)and particle beam mass spectrometer (PBMS) which installed in the reactor exhaust line. The particle current and number count are monitored at set-up, stabilize, deposition, purge and pumping process step in real-time. The particle number distribution at stabilize step was measured using PBMS and compared with SEM image data. The PBMS and SEM analysis data shows the 110 nm and 80 nm of mode diameter for BPSG and PSG process, respectively.

참고문헌 (Reference)

1 Peters, L., "good reasons to use in situ particle monitors, Semicond"

2 Takahashi. K. M, "capabilities and limitations of in situ particle monitors in silicon processing equipment" 14 : 2983-2993, 1996

3 Shen, Z., "The Formation of Highly Uniform Silicon Nanoparticles in High Density Silane Plasmas" 94 : 2277-2283, 2003

4 Bowling, R. A., "Status and Needs of In-Situ Real-time Process Particle Detection" 32 : 22-27, 1989

5 Hara, T., "Reflow of PSG Layers by Halogen Lamp Short Duration Heating Technique" 23 : 452-454, 1984

6 Dance, D. L., "Reducing Process Equipment Cost of Ownership Through In Situ Contamination Prevention and Reduction" 10 : 21-27, 1992

7 McMurry, P. H., "Particle-Beam Mass-Spectrometer Measurements of Particle Formation During Low- Pressure Chemical-Vapor-Deposition of Polysilicon and SiO2-Films" 14 : 582-587, 1996

8 Kim, T., "Particle formation during low-pressure chemical vapor deposition from silane and oxygen; Measurement, modeling and film properties" 20 : 413-423, 2002

9 Ziemann, P. J., "Particle beam mass spectrometry of submicron particles charged to saturation in an electron beam" 26 : 745-756, 1995

10 Campbell, S., "Investigation of particle formation during the plasma enhanced chemical vapor deposition of amorphous silicon, oxide, and nitride films" 16 : 483-489, 1998

11 Liu, P., "Generating Particle Beams of Controlled Dimensions and Divergence: II. Experimental Evaluation of Particle Motion in Aerodynamic Lenses and Nozzle Expansions" 22 : 314-324, 1995

12 Liu, P., "Generating Particle Beams of Controlled Dimensions and Divergence: I. Theory of Particle Motion in Aerodynamic Lenses and Nozzle Expansions" 22 : 293-313, 1995

13 Bowing, R. A, "Deposition and reflow of phosphosilicate glass" 132 : 141-145, 1985

14 Nijhawan, S., "An experimental and numerical study of particle nucleation and growth during low-pressure thermal decomposition of silane, J" 34 : 691-711, 2003

15 Armstrong, W. E., "A Scanning Electron Microscope Investigation of Glass Flow in MOS Integrated Circuit Fabrication" 121 : 307-310, 1974