Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

다국어 초록 (Multilingual Abstract)

An electron cyclotron wave resonant methane plasma discharge was used for the high rate deposition of hydrogenated amorphous
carbon (a-C:H). Deposition rates of up to 400 AA/min were obtained over substrates up to 2.5 in. in diameter with a film
thickness uniformity of 10%. The deposited films were characterised in terms of their mass density, sp3 and hydrogen contents,
C–H bonding, intrinsic stress, scratch resistance and friction properties. The deposited films possessed an average sp3 content, mass
density and refractive index of 58%, 1.76 g/cm3 and 2.035 respectively.
Mechanical characterisation indicated that the films possessed very low steady-state coefficients of friction (ca. 0.06) and a
moderate shear strength of 141 MPa. Nano-indentation measurements also indicated a hardness and elastic modulus of 16.1 and
160 GPa respectively. The critical loads required to induce coating failure were also observed to increase with ion energy as a
consequence of the increase in degree of ion mixing at the interface. Furthermore, coating failure under scratch test conditions was
observed to take place via fracture within the silicon substrate itself, rather than either in the coating or at the film/substrate
interface.
2003 Elsevier B.V. All rights reserved.