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이 학술지의 논문 검색
Wang, H.; An, H.; Zhang, F.; Zhang, Z.; Ye, M.; Xiu, P.; Zhang, Y.; Hu, J. American Vacuum Society; 1999 2008 p.L41-L44
Sumiya, M.; Bruce, R.; Engelmann, S.; Weilnboeck, F.; Oehrlein, G.S. American Vacuum Society; 1999 2008 p.1637-1646
Sumiya, M.; Bruce, R.; Engelmann, S.; Weilnboeck, F.; Oehrlein, G.S. American Vacuum Society; 1999 2008 p.1647-1653
Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists
Choi, S.; Word, M.J.; Kumar, V.; Adesida, I. American Vacuum Society; 1999 2008 p.1654-1659
Nanofabrication by mechanical and electrical processes using electrically conductive diamond tip
Miyake, S.; Zheng, H.; Kim, J.; Wang, M. American Vacuum Society; 1999 2008 p.1660-1665
Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media
Sbiaa, R.; Tan, E.L.; Seoh, R.M.; Aung, K.O.; Wong, S.K.; Piramanayagam, S.N. American Vacuum Society; 1999 2008 p.1666-1669
Oxidation behavior of In~9~5Sn~5 solid solution
Ramasamy, S.; Sabarinathan, V.; Agarwal, N.; Smith, D.J. American Vacuum Society; 1999 2008 p.1670-1674
Comparative study of Cl~2, Cl~2/O~2, and Cl~2
Carlstrom, C.F.; van der Heijden, R.; Andriesse, M.S.P.; Karouta, F.; van der Heijden, R.W.; van der Drift, E.; Salemink, H.W.M. American Vacuum Society; 1999 2008 p.1675-1683
Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography
Ting, Y.-H.; Park, S.-M.; Liu, C.-C.; Liu, X.; Himpsel, F.J.; Nealey, P.F.; Wendt, A.E. American Vacuum Society; 1999 2008 p.1684-1689
Fabrication of concave gratings by curved surface UV-nanoimprint lithography
Chen, Y.-P.; Lee, Y.-P.; Chang, J.-H.; Wang, L.A. American Vacuum Society; 1999 2008 p.1690-1695