In this work, Ni thin films with different thickness from 1,523 Å to 9,827 Å were deposited for the application of micro thermal flow sensors by a magnetron sputtering and oxidized through annealing at 450 ℃ with increasing annealing time. The i...
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https://www.riss.kr/link?id=A103877118
Sangsoo Noh (Daeyang Electric Co., Ltd.) ; Wen-Teng Jang (National University of Kaohsiung) ; Eungahn Lee (Daeyang Electric Co., Ltd.) ; Sungil Lee (Daeyang Electric Co., Ltd.)
2007
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Flow sensors ; Ni thin films ; Oxide ; Resistivity ; TCR ; Flow sensors ; Ni thin films ; Oxide ; Resistivity ; TCR
KCI등재,SCOPUS,ESCI
학술저널
161-165(5쪽)
0
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
In this work, Ni thin films with different thickness from 1,523 Å to 9,827 Å were deposited for the application of micro thermal flow sensors by a magnetron sputtering and oxidized through annealing at 450 ℃ with increasing annealing time. The i...
In this work, Ni thin films with different thickness from 1,523 Å to 9,827 Å were deposited for the application of micro thermal flow sensors by a magnetron sputtering and oxidized through annealing at 450 ℃ with increasing annealing time. The initial variation of resistivity decreased radically with increasing films thickness, then gradually stabilizes as the thickness increases. The resistivity of Ni thin films with 3,075 Å increased suddenly with increasing annealing time at 450 ℃, then gradually stabilizes as the thickness increases after the annealing time 9h. In case of 3,075 Å and 9,827 Å films, the average of TCR values, measured for the operating temperature range of 0℃ to 180℃, were 2,413.1 ppm/℃ and 4,438.5 ppm/℃, respectively. Because of their high resistivity and very linear TCR, Ni oxide thin films are superior to pure Ni and Pt thin films for flow and temperature sensor applications.
참고문헌 (Reference)
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6 "Flow measurements in open irrigation channels" 3 : 12-, 2000
7 "Fabrication of PRTs and analysis of characteristics" 39 : 1179-, 2003
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9 "Electrical properties of nickel-zirconia cermet films for temperature and flow-sensor application" 63 (63): 33-, 1997
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1 "high-performance mass-flow sensor with integrated laminar flow micro-channels" 1985
2 "Thermal sensor properties of cermet resistor films on silicon substrates" 90 (90): 118-, 2001
3 "On the design of a wide range mini-flow paddlewheel flow sensors" 87 (87): 1-, 2000
4 "Microstructure and temperature coefficient of resistance of platinum films" 36 : 834-, 1997
5 "Integrated silicon anemometer" 1974
6 "Flow measurements in open irrigation channels" 3 : 12-, 2000
7 "Fabrication of PRTs and analysis of characteristics" 39 : 1179-, 2003
8 "Fabrication and characterisation of NiO/ZnO structures" 100 (100): 270-, 2004
9 "Electrical properties of nickel-zirconia cermet films for temperature and flow-sensor application" 63 (63): 33-, 1997
10 "Design of a new sensor for mass flow controller using thin-film technology based on an analytical thermal model" A (A): 3559-, 1998
11 "Characterization of highly Doped n- and p- type 6H-SiC Piezoresistors" 45 : 785-, 1998
12 "A study of electrical properties and microstructure of nitrogen-doped poly-SiC films deposited by LPCVD" 136 (136): 613-, 2007
13 "A flow direction sensor fabricated using MEMS technology and its simple interface circuit" 91 (91): 347-, 2003
Electrical Properties of BaTiO3 Thick Films Fabricated by Screen-printing Method
A Novel Sulphur Cathode Materials for Rechargeable Lithium Batteries
학술지 이력
연월일 | 이력구분 | 이력상세 | 등재구분 |
---|---|---|---|
2023 | 평가예정 | 해외DB학술지평가 신청대상 (해외등재 학술지 평가) | |
2020-01-01 | 평가 | 등재학술지 유지 (해외등재 학술지 평가) | |
2011-01-01 | 평가 | 등재학술지 유지 (등재유지) | |
2009-01-01 | 평가 | 등재학술지 유지 (등재유지) | |
2006-01-01 | 평가 | 등재학술지 선정 (등재후보2차) | |
2005-05-30 | 학회명변경 | 영문명 : 미등록 -> The Korean Institute of Electrical and Electronic Material Engineers | |
2005-05-30 | 학술지명변경 | 한글명 : Transactions on Electrical and Electroni -> Transactions on Electrical and Electronic Materials | |
2005-01-01 | 평가 | 등재후보 1차 PASS (등재후보1차) | |
2003-01-01 | 평가 | 등재후보학술지 선정 (신규평가) |
학술지 인용정보
기준연도 | WOS-KCI 통합IF(2년) | KCIF(2년) | KCIF(3년) |
---|---|---|---|
2016 | 0.08 | 0.08 | 0.1 |
KCIF(4년) | KCIF(5년) | 중심성지수(3년) | 즉시성지수 |
0.1 | 0.11 | 0.239 | 0.07 |