http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
https://www.riss.kr/link?id=O37319159
2001년
eng
학술저널
PROCEEDINGS OF THE IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE
283-288 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
0780366786
International interconnect technology conference
Burlingame, CA
2001; Jun
0
상세조회0
다운로드
Invited - From PVD to CVD to ALD for Interconnects and Related Applications
Invited - Copper Wetting of Two-Dimensional Silicates: Robust Barriers for Interconnect Applications
A High Performance Liner for Copper Damascene Interconnects
Superfilling CVD of Copper Using a Catalytic Surfactant