Recently, lithium tantalate (LiTaO₃, LT) has been widely used for a piezoelectric material for SAW components and optical waveguides because of its piezoelectric, electro-optical, nonlinear optical characteristics, and a wide transparency range from...
Recently, lithium tantalate (LiTaO₃, LT) has been widely used for a piezoelectric material for SAW components and optical waveguides because of its piezoelectric, electro-optical, nonlinear optical characteristics, and a wide transparency range from ultraviolet to infrared. LT wafers should be polished to be used for substrates of device and waveguides due to surface scattering. However, few researchers have been reported on the chemical mechanical polishing (CMP) of LT. In this paper, we investigated the characteristics of potassium hydroxide (KOH)-hydrogen peroxide (H₂O₂) based slurry in CMP of LT by using modification of KOH based CMP slurry.