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Sputtering Deposition of Aluminium Molybdenum Alloy Thin Film Anodes for Thin Film Microbatteries
Balaji Sivaramakrishnan,Mani Chandran Thirumoolam,Mutharasu Devarajan 대한금속·재료학회 2015 ELECTRONIC MATERIALS LETTERS Vol.11 No.3
Al5Mo thin film anodes for Li-ion batteries were prepared using DC sputtering under different conditions, the latter being specified as deposition at room temperature (S0), deposition at 300°C (S1), and deposition at room temperature followed by thermal annealing at 300°C (S2). The thin films were deposited using an aluminum target tiled with molybdenum discs at a ratio calculated based on the theoretical sputtering yields. The structural and compositional analyses performed with x-ray diffraction (XRD) and energy-dispersive x-ray spectroscopy (EDX) confirmed the Al5Mo compound formation and the Al/Mo elemental ratio, respectively. The compound formation was observed to be evident only for the thin films subjected to heat treatment during or after deposition. Scanning electron micrographs reveal a higher porosity of approximately 23% for sample S0 and a lower porosity of around 18% for sample S1. The chronopotentiometry results show a higher volumetric specific capacity of approximately 197 mAh/cm3 for sample S1. Capacity increments have been observed for all samples upon charge-discharge cycles, whose values after 25 cycles for samples S0, S1, and S2 were 41.2%, 20.4%, and 21.1%, respectively.
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