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성덕경,최정옥,안일신,김옥경 한양대학교 이학기술연구소 2004 이학기술연구지 Vol.7 No.
금박막은 높은 전도성의 화학적인 안정성을 가지고 있으므로 GaAs를 기판으로 한 bevice에서 널리 쓰이고 있으며 SAM(Self-Assembled Monolayer), Nanolithography 등에서도 아주 주요하게 사용되고 있다. 본 연구에서는 염소가 포함된 액체에 금박막이 접해있고 UV를 조사하여 식각이 되는 것을 발견하고 연구하였다. 노광량을 조절하여 금박막의 기각률을 조절할수 있으며, 또한 가모강제 공정을 거치지 않고 금박막에 직접 조사하게 되므로 간단하게 패터닝을 할수 있다. AFM(atomic force microscope), optical microscope, ellipsometry 를 이용하여 식각률 측정 및 표면 변화를 보았다. Various metals or their alloys are used in the semiconductor metallization process or in micro-or nano-structure devices. We report a novel etching technique of gold film based on new phenomenon that gold is soluble in chlorine containing solutions or solvents under UV irradiation. Mask patterns can be transferred to gold surface directly without resorting to complicate photoresist process. And, etch rate could be controlled from sub nanometer to few tens of nanometers per minute by adjusting exposure parameters. Moreover, non-toxic liquid such as NaCl solution can be used for the process. AFM(atomic force microscope), optical microscope, ellipsometry were used to characterize the etch rate and the surface morphology.
성덕경,방경윤,오영륙,최은호,안일신,김옥경 한양대학교 이학기술연구소 2003 이학기술연구지 Vol.6 No.-
Spectroscopic ellipsometry 은 다양한 물질의 광학적 특징을 연구할 수 있는 강력한 기술이다. 현재 실리콘 웨이퍼 위의 박막 분석에는 그 효율성이 확실히 입증되어 있다. 그러나 현재 산업은 유리 기판위의 박막을 분석하기를 원하고 있다. Ellipsometry로 투명기판을 분석하기 위해서는 후면 반사에의한 비간섭성 효과를 고려해야 한다. 기존의 반사공식을 투명기판의 비간섭성을 고려하여 수정하였다. 투명기판 위의 샘플과 scratch를 낸 같은 샘플을 측정 분석하여 정확성을 확인하였다. 수정된 반사공식을 이용하면 디스플레이와 같은 투명재료를 이용하는 곳에 유용하게 사용될 것으로 기대되고 있다. A Spectroscpic ellipsometry is very strong technology to study optical properties of many materials. It has already substantiated a analytic efficiency about thin films above wafers to be made of silicon. However, the current industry needs thin films analyzed on a glass. When we analyze a glass using a ellipsometry, we have to consider a efficiency of incoherence due to reflect at the back side. So then, we slightly altered the original formula. We compared a scratched sample with a sample on the glass, because off getting a exactitude. Our technical development, using the changed formula, is expected the useful utilization in a part of using gIasses such as display.
습식텍스쳐를 이용한 삼결정 실리콘 광학적.전기적 특성 연구
한규민(Han, Kyu-Min),유진수(Yoo, Jin-Su),유권종(Yoo, Kwon-Jong),이희덕(Lee, Hi-Deok),최성진(Choi, Sung-Jin),권준영(Kwon, Jun-Young),김기호(Kim, Ki-Ho),이준신(Yi, Jun-Sin) 한국신재생에너지학회 2009 한국신재생에너지학회 학술대회논문집 Vol.2009 No.06
Two different wet etching solutions, NaOH 40% and Acid, were used for etching in tri-crystalline Silicon(Tri-Si) solar cell fabrication. The wafers etched in NaOH40% solution showed higher reflectance compared to the wafers etched in Acid solution after SiN_x deposition. In light current-voltage results, the cells etched in Acid solution exhibited higher short circuit current and open circuit voltage than those of the cells etched in NaOH 40% solution. We have obtained 16.70% conversion efficiency in large area(156cm²) Tri-Si solar cells etched in Acid solution.
Deok-Sin Kil,Seung-Jin Yeom,Kwon Hong,Jae-Sung Roh,Hyun-Cheol Sohn,Jin-Woong Kim,Sung-Wook Park 대한전자공학회 2005 Journal of semiconductor technology and science Vol.5 No.2
We have proposed a characteristic method to estimate real composition when multi component oxide films are deposited by ALD. Final atomic concentration ratio was theoretically calculated from the film densities and growth rates for HfO₂and Al₂O₃using ALD processed HfxAlyOz films. We have transformed initial source feeding ratio during deposition to final atomic ratio in HfxAlyOz films through thickness factors (R_(HfO₂) and R_(Al₂O₃)) and concentration factor(C) defined in our experiments. Initial source feeding ratio could be transformed into the thickness ratio by each thickness factor. Final atomic ratio was calculated from thickness ratio by concentration factor. It has been successfully confirmed that the predicted atomic ratio was in good agreement with the actual measured value by ICP-MS analysis.
( Deok Sin Kil ),( Kwon Hong ),( Seung Jin Yeom ),( Han Sang Song ),( Ki Seon Park ),( Jae Sung Roh ),( Noh Jung Kwak ),( Hyun Chul Sohn ),( Jin Woong Kim ) 대한금속재료학회 ( 구 대한금속학회 ) 2006 ELECTRONIC MATERIALS LETTERS Vol.2 No.1
Compositionally stepped HfxAlyOz dielectric thin films were fabricated for application to DRAM capacitor dielectrics. Compositionally stepped HfxAlyOz dielectric thin film is composed of an Al rich bottom layer and a Hf rich top layer between top and bottom TiN electrodes. The leakage current of TIT (TiN/Insulator/TiN) capacitors with compositional stepped HfxAlyOz could be lowered by compositional stepping and accompanying post ozone treatment, respectively. The prepared TIT capacitor showed drastically reduced leakage current and highly improved break down voltage characteristics of 0.45~0.75 V, while maintaining the same equivalent oxide thickness (EOT). In the case of stepped film with Hf/Al=1/1, EOT showed a very small value of 12.8 Å while maintaining leakage current as low as 2×10(-16)A/cell at +1.0 V.
Kil, Deok-Sin,Yeom, Seung-Jin,Hong, Kwon,Roh, Jae-Sung,Sohn, Hyun-Cheol,Kim, Jin-Woong,Park, Sung-Wook The Institute of Electronics and Information Engin 2005 Journal of semiconductor technology and science Vol.5 No.2
We have proposed a characteristic method to estimate real composition when multi component oxide films are deposited by ALD. Final atomic concentration ratio was theoretically calculated from the film densities and growth rates for $HfO_2$ and $Al_2O_3$ using ALD processed HfxAhOz mms.W e have transformed initial source feeding ratio during deposition to fins] atomic ratio in $Hf_xAl_yO_z$ films through thickness factors ($R_{HFO_2}$ ami $R_{Al_2O_3}$) ami concentration factor(C) defined in our experiments. Initial source feeding ratio could be transformed into the thickness ratio by each thickness factor. Final atomic ratio was calculated from thickness ratio by concentration factor. It has been successfully confirmed that the predicted atomic ratio was in good agreement with the actual measured value by ICP-MS analysis.
낙동강 원수를 대상으로 Al염계 및 Fe염계 응집제를 이용한 고도응집의 적용
문신득(Sin Deok Moon),손희종(Hee Jong Son),염훈식(Hoon Sik Yeom),최진택(Jin Taek Choi),정철우(Chul Woo Jung) 大韓環境工學會 2012 대한환경공학회지 Vol.34 No.9
고도응집 공정은 DBP 전구물질인 NOM을 제거하는 최적기법이다. 본 연구에서는 낙동강 원수를 대상으로 FeCl₃, alum, PSOM 및 PACl 응집제를 대상으로 고도응집 공정의 적용시 가장 효과적인 응집제와 응집조건을 DOC, THMFP, HAAFP 및 제타전위 변화를 중심으로 평가하였다. 탁도 제거율은 고도응집을 적용시 기존응집에 비해 제거율의 상승은 없었으며, 일정 응집제 주입량 이상에서는 제거율이 더욱 저하되었으나 DOC, THMFP 및 HAAFP 제거율은 응집제 종류별로 기존응집에 비해 각각 13~18%, 9~18% 및 9~18% 정도 증가하였다. 응집 pH 변화에 따른 탁도 제거특성은 FeCl₃와 PACl이 pH 4~10 범위에서 비교적 높은 탁도 제거율을 나타내었고 alum과 PSOM의 경우는 pH 5~8의 범위에서 안정적인 제거율을 나타내었다. DOC는 4종의 응집제 모두 pH 5~7 범위에서 안정적인 제거율을 나타내었다. 고도응집 공정을 적용시 1 kDa 이하 및 10 kDa 이상의 용존 유기물질의 제거율은 각각 11~21% 및 16% 정도 기존응집 공정에 비해 증가하였으며, 소수성 및 친수성 유기물질의 제거율은 각각 27~38% 및 11~15% 정도 증가하였다. 낙동강 원수의 고도응집에 가장 효과적인 응집제로는 FeCl₃로 나타났으며, 다음으로 PSOM, PACl 및 alum 순이었다. Enhanced coagulation is best available technologies to treat NOM in water to produce clean drinking water. In this research, the comparison experiments between conventional coagulation (CC) and enhanced coagulation (EC) using 4 type coagulants i.e., ferric chloride, aluminium sulphate (alum), poly aluminium sulphate organic magnesium (PSOM) and poly aluminium chloride (PACl) were performed in terms of surrogate parameters such as dissolved organic carbon (DOC), trihalomethane formation potential (THMFP), haloacetic acid formation potential (HAAFP) and zeta potential variation in order to find out the most effective coagulant and conditions to fit Nakdong River water. When applied to EC process, the turbidity removal efficiency did not increased gradually compared to the CC process when adding coagulants. Furthermore, the removal efficiency of turbidity became decreased much more as coagulants were added increasingly whereas the removal efficiency of DOC, THMFP and HAAFP became increased by 13~18%, 9~18% and 9~18% respectively compared to the CC process. The characteristics of turbidity removal showed relatively high removal efficiency considering the pH variation in entire pH range when using FeCl₃ and PACl. Additionally, in case of alum and PSOM steady removal efficiency was shown between pH 5 and pH 8. In terms of DOC surrogate the coagulants including 4 type coagulants indicated high removal efficiency between pH 5 and pH 7. The removal efficiency of dissolved organic matter (DOM) in EC between less than 1 kDa and more than 10 kDa augmented by 11~21% and 16% respectively compared to the CC process. The removal efficiency of hydrophobic and hydrophilic organic matter proved to be increased by 27~38% and 11~15% respectively. In conclusion, the most effective coagulant relating to EC for Nakdong River water was proved to be FeCl₃ followed by PSOM, PAC and alum in order.